Kinetics of Adsorption Layer Formation in Solutions of Polyacid/Surfactant Complexes

2009 ◽  
Vol 113 (14) ◽  
pp. 5664-5671 ◽  
Author(s):  
Alexey G. Bykov ◽  
Shi-Yow Lin ◽  
Giuseppe Loglio ◽  
Reinhard Miller ◽  
Boris A. Noskov
1996 ◽  
Vol 440 ◽  
Author(s):  
V.S. Aliev ◽  
V.N. Kruchinin

AbstractThe development of the roughness of the Si (100) surface has been investigated at the initial stage of etching in the molecular flow of F2 and XeF2 gases. It was discovered that roughness grew during etching in XeF2 gas and decreased during etching in F2 gas, that is, F2 gas polishes Si surface unlike XeF2. This difference was explained with the help of ellipsometric study of the kinetics of adsorption layer formation.


2018 ◽  
Vol 20 (4) ◽  
pp. 2403-2412 ◽  
Author(s):  
Dominik Kosior ◽  
Jan Zawala

We show, for the first time, the influence of the initial adsorption coverage over a bubble on the kinetics of dynamic adsorption layer formation.


1990 ◽  
Vol 87 ◽  
pp. 1597-1607 ◽  
Author(s):  
L Benedetti ◽  
M Borsari ◽  
C Fontanesi ◽  
G Battistuzzi Gavioli

2007 ◽  
Vol 1 (6) ◽  
pp. 685-691
Author(s):  
Yu. A. Kolbanovskii ◽  
I. V. Bilera ◽  
A. A. Borisov

1963 ◽  
Vol 89 (6) ◽  
pp. 53-55 ◽  
Author(s):  
Walter J. Weber ◽  
J. Carrell Morris

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