FT-IR Study of the Gas-Phase Thermolysis of Triethylgermane

1995 ◽  
Vol 14 (7) ◽  
pp. 3507-3515 ◽  
Author(s):  
Philip G. Harrison ◽  
Ashley C. Torr
Keyword(s):  
Ft Ir ◽  
Author(s):  
Anastasia Filtschew ◽  
Pablo Beato ◽  
Søren Birk Rasmussen ◽  
Christian Hess

The role of platinum on the room temperature NOx storage mechanism and the NOx desorption behavior of ceria was investigated by combining online FT-IR gas-phase analysis with in situ Raman...


1994 ◽  
Vol 13 (5) ◽  
pp. 1569-1574 ◽  
Author(s):  
Philip G. Harrison ◽  
David M. Podesta
Keyword(s):  
Ft Ir ◽  

2006 ◽  
Vol 22 (7) ◽  
pp. 809-814
Author(s):  
G JIN ◽  
Y GUO ◽  
X LIU ◽  
W YAO ◽  
Y GUO ◽  
...  

2004 ◽  
Vol 82 (6) ◽  
pp. 1006-1012 ◽  
Author(s):  
Yaqian Liu ◽  
Corey A Rice ◽  
Martin A Suhm

Jet-FT-IR spectra of aminoethanol (AE), N-methylaminoethanol (MAE), and N,N-dimethylaminoethanol (DMAE) are presented and compared to gas-phase and matrix isolation IR, microwave, and quantum chemical data. The intramolecular O-H···N hydrogen bond gives rise to characteristically shifted O-H stretching bands and torsional difference bands in the monomer spectra. It stabilizes one out of 14 diastereomeric monomer conformations of AE and DMAE and two out of 27 diastereomeric MAE conformations. The latter two correspond to torsional or N-inversional isomers, the interconversion of which is hindered by the intramolecular hydrogen bond. Their energy difference is found to be <1.2 kJ/mol. The intermolecular aggregation patterns of the three aminoethanols are quite distinct and non-monotonic, as suggested by their O-H stretching fingerprints.Key words: aminoethanol, IR spectroscopy, conformation, hydrogen bond, supersonic jet.


1981 ◽  
Vol 85 (8) ◽  
pp. 1024-1027 ◽  
Author(s):  
H. Niki ◽  
P. D. Maker ◽  
C. M. Savage ◽  
L. P. Breitenbach
Keyword(s):  
Ft Ir ◽  

1997 ◽  
Vol 538 (1-2) ◽  
pp. 19-29 ◽  
Author(s):  
Philip G. Harrison ◽  
Ashley Torr
Keyword(s):  
Ft Ir ◽  

2007 ◽  
Vol 62 (11) ◽  
pp. 1411-1421 ◽  
Author(s):  
Sebastian Patzig ◽  
Gerhard Roewer ◽  
Edwin Kroke ◽  
Ingo över

Solutions consisting of HF - NOHSO4 - H2SO4 exhibit a strong reactivity towards crystalline silicon which is controlled by the concentrations of the reactive species HF and NO+. Selective isotropic and anisotropic wet chemical etching with these solutions allows to generate a wide range of silicon surface morphology patterns. Traces of Ag+ ions stimulate the reactivity and lead to the formation of planarized (polished) silicon surfaces. Analyses of the silicon surface, the etching solution and the gas phase were performed with scanning electron microscopy (SEM), DR/FT-IR (diffusive reflection Fourier transform infra-red), FT-IR, Raman and NMR spectroscopy, respectively. It was found that the resulting silicon surface is hydrogen-terminated. The gas phase contains predominantly SiF4, NO and N2O. Furthermore, NH4+ is produced in solution. The study has confirmed the crucial role of nitrosyl ions for isotropic wet chemical etching processes. The novel etching system is proposed as an effective new way for selective surface texturing of multi- and monocrystalline silicon. A high etching bath service lifetime, besides a low contamination of the etching solution with reaction products, provides ecological and economical advantages for the semiconductor and solar industry.


2012 ◽  
Vol 116 (17) ◽  
pp. 5172-5178 ◽  
Author(s):  
Yudai Yamaoki ◽  
Hiroshi Imamura ◽  
Aleksandra Fulara ◽  
Sławomir Wójcik ◽  
Łukasz Bożycki ◽  
...  

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