AbstractHerein, we introduce a method to simultaneously photoadhere a photocrosslinkable polymer to a plasma-treated fluoropolymer while photopatterning the photocrosslinkable polymer via a single-photo-exposure as a new electrode passivation technique. Photoadhesion was determined to result from plasma-generated radicals of the plasma-treated fluoropolymer. Crystallinity of the fluoropolymer was analysed to determine the photoadhesion strength through its effects on both the formation of radicals and the etching of fluoropolymers. Passivation feasibility of simultaneous photoadhesion and photopatterning (P&P) technique were demonstrated by fabricating an Au electrocorticography electrode array and modifying the electrode with electro-deposited metallic nanoparticles. Adhesion of sputter-deposited Au to the fluoropolymer was dependent on mechanical interlocking, indicated by the formation of Au clusters which are typically influenced by the surface temperature during the sputter-deposition and the glass transition temperature of the fluoropolymer. The adhesion of Au to the fluoropolymer without an additional adhesion promotor and the proposed P&P passivation technique would help prevent detachment of the electrode and the delamination of the passivation layer in fluoropolymer-based neural electrode.
Flexible Neural Electrode Array Based-on Porous Graphene for Cortical Microstimulation and Sensing