scholarly journals ALD/MLD processes for Mn and Co based hybrid thin films

2016 ◽  
Vol 45 (26) ◽  
pp. 10730-10735 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

2014 ◽  
Vol 50 (65) ◽  
pp. 9176-9178 ◽  
Author(s):  
Debabrata Sarkar ◽  
Dereje Hailu Taffa ◽  
Sergey Ishchuk ◽  
Ori Hazut ◽  
Hagai Cohen ◽  
...  

Tailor-made metal oxide (MO) thin films with controlled compositions, electronic structures, and architectures are obtained via molecular layer deposition (MLD) and solution treatment.


RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.


2020 ◽  
Vol 8 (5) ◽  
pp. 2539-2548 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Malin Solheim Olsen ◽  
Per-Anders Hansen ◽  
Håkon Valen ◽  
Ola Nilsen

Thin films of metal–organic frameworks (MOFs) are promising for a wide range of applications including membranes for separations and sensor materials in microelectronics.


2015 ◽  
Vol 44 (33) ◽  
pp. 14782-14792 ◽  
Author(s):  
Yan-Qiang Cao ◽  
Lin Zhu ◽  
Xin Li ◽  
Zheng-Yi Cao ◽  
Di Wu ◽  
...  

Ti-based fumaric acid hybrid thin films were successfully prepared using inorganic TiCl4 and organic fumaric acid as precursors by molecular layer deposition (MLD).


2016 ◽  
Vol 52 (6) ◽  
pp. 1139-1142 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal–organic framework (MOF) thin films on various substrate surfaces.


2017 ◽  
Vol 46 (48) ◽  
pp. 16983-16992 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Veljko Petrovic ◽  
Ola Nilsen

Thin films of metal–organic frameworks (MOFs) prepared using all-gas-phase techniques such as atomic/molecular layer deposition (ALD/MLD) are emerging due to their potential for enabling suitable applications.


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