scholarly journals ALD/MLD fabrication of luminescent Eu-organic hybrid thin films using different aromatic carboxylic acid components with N and O donors

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carboxylic Acid ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Aromatic Carboxylic Acid ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.

scholarly journals ALD/MLD processes for Mn and Co based hybrid thin films

2016 ◽  
Vol 45 (26) ◽  
pp. 10730-10735 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Terephthalic Acid ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Benzenedicarboxylic Acid ◽  
Hybrid Thin Films ◽  
Metal Organic

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

scholarly journals Inorganic–organic superlattice thin films for thermoelectrics

2015 ◽  
Vol 3 (40) ◽  
pp. 10349-10361 ◽  
Author(s):  
J.-P. Niemelä ◽  
A. J. Karttunen ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Conductivity ◽  
Thermoelectric Materials ◽  
Electrical Transport ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Electrical Transport Properties ◽  
Molecular Layer Deposition ◽  
Layer Deposition

Nanoscale layer-engineering using the combined atomic/molecular layer deposition (ALD/MLD) technique for the fabrication of oxide–organic thin-film superlattices is an attractive way to tailor the performance of thermoelectric materials as it potentially allows us to suppress thermal conductivity without significantly hindering the electrical transport properties.

scholarly journals Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

2020 ◽  
Vol 49 (32) ◽  
pp. 11310-11316
Author(s):  
Aida Khayyami ◽  
Anish Philip ◽  
Jenna Multia ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.

Tailor-made oxide architectures attained by molecularly permeable metal-oxide organic hybrid thin films

2014 ◽  
Vol 50 (65) ◽  
pp. 9176-9178 ◽  
Author(s):  
Debabrata Sarkar ◽  
Dereje Hailu Taffa ◽  
Sergey Ishchuk ◽  
Ori Hazut ◽  
Hagai Cohen ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Oxide ◽  
Electronic Structures ◽  
Molecular Layer ◽  
Solution Treatment ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Tailor-made metal oxide (MO) thin films with controlled compositions, electronic structures, and architectures are obtained via molecular layer deposition (MLD) and solution treatment.

scholarly journals Atomic/molecular layer deposition of Ni-terephthalate thin films

2021 ◽  
Author(s):  
Anish Philip ◽  
Sami Vasala ◽  
Pieter Glatzel ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Organic Components ◽  
Layer Deposition ◽  
Metal Organic

Atomic/molecular layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential...

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

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