Low-temperature chemical vapor deposition of cobalt oxide thin films from a dicobaltatetrahedrane precursor
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Application of a novel liquid cobalt precursor, which forms cobalt oxide films at low temperatures using relatively simple CVD process.
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1991 ◽
Vol 23
(1)
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pp. 25-29
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2001 ◽
Vol 11
(PR3)
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pp. Pr3-637-Pr3-643
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1998 ◽
Vol 20
(1-4)
◽
pp. 55-64
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