Metal-assisted selective recognition of biothiols by a synthetic receptor array

2018 ◽  
Vol 54 (93) ◽  
pp. 13147-13150 ◽  
Author(s):  
Yang Liu ◽  
Yaokai Duan ◽  
Adam D. Gill ◽  
Lizeth Perez ◽  
Qiaoshi Jiang ◽  
...  

A synergistic combination of a deep cavitand host, fluorophore guests and transition metal ions can be used to sense small molecule thiols of biological interest with good efficiency and selectivity in complex aqueous media.

3 Biotech ◽  
2015 ◽  
Vol 5 (5) ◽  
pp. 791-798 ◽  
Author(s):  
Vijay Kumar ◽  
Virender Kumar ◽  
Niraj Upadhyay ◽  
Sitansh Sharma

2012 ◽  
Vol 36 (3) ◽  
pp. 146-148
Author(s):  
Yan Gao ◽  
Jian Song ◽  
Wei Wang

Four novel azobenzene derivatives, 4,4'-bis(CH2SAr)azobenzene (Ar = different heterocyclic units), have been prepared and characterised by IR, 1H NMR, 13C NMR, MS and elemental analysis. Their complexation properties to different heavy and transition metal ions have been studied by UV and fluorescence spectra. The compound 4,4'-bis(4,6-dimethyl-pyrimidine-2-ylmethylthio)azobenzene shows selective recognition of Hg2+.


Author(s):  
R. Ai ◽  
H.-J. Fan ◽  
L. D. Marks

It has been known for a long time that electron irradiation induces damage in maximal valence transition metal oxides such as TiO2, V2O5, and WO3, of which transition metal ions have an empty d-shell. This type of damage is excited by electronic transition and can be explained by the Knoteck-Feibelman mechanism (K-F mechanism). Although the K-F mechanism predicts that no damage should occur in transition metal oxides of which the transition metal ions have a partially filled d-shell, namely submaximal valence transition metal oxides, our recent study on ReO3 shows that submaximal valence transition metal oxides undergo damage during electron irradiation.ReO3 has a nearly cubic structure and contains a single unit in its cell: a = 3.73 Å, and α = 89°34'. TEM specimens were prepared by depositing dry powders onto a holey carbon film supported on a copper grid. Specimens were examined in Hitachi H-9000 and UHV H-9000 electron microscopes both operated at 300 keV accelerating voltage. The electron beam flux was maintained at about 10 A/cm2 during the observation.


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