scholarly journals A Study on Three Dimensional Mask Effect of Attenuated Phase-Shift Mask in Advanced Optical Lithography

2020 ◽  
Vol 29 (4) ◽  
pp. 648-650
Author(s):  
Yuanfang Wu ◽  
Guangwen Bao ◽  
Lisong Dong ◽  
Yayi Wei
Keyword(s):  
Phase Shift ◽  
Three Dimensional ◽  
Optical Lithography ◽  
Phase Shift Mask

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

1999 ◽  
Author(s):  
Zhijian G. Lu ◽  
Yuping Cui ◽  
Alan C. Thomas ◽  
Scott M. Mansfield ◽  
Gerhard Kunkel ◽  
...  
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Phase Shift Mask ◽  
Selection Of

Variable phase-shift mask for deep-submicron optical lithography

1991 ◽  
Author(s):  
Tsuneo Terasawa ◽  
Norio Hasegawa ◽  
Akira Imai ◽  
Toshihiko P. Tanaka ◽  
Souichi Katagiri
Keyword(s):  
Phase Shift ◽  
Deep Submicron ◽  
Optical Lithography ◽  
Variable Phase ◽  
Phase Shift Mask

0.12 μm optical lithography performances using an alternating DUV phase shift mask

1998 ◽  
Vol 41-42 ◽  
pp. 61-64 ◽  
Author(s):  
Y. Trouiller ◽  
N. Buffet ◽  
T. Mourier ◽  
P. Schiavone ◽  
Y. Quere
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Phase Shift Mask

0.12 µm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6714-6717 ◽  
Author(s):  
Yorick Trouiller ◽  
Nicolas Buffet ◽  
Thierry Mourier ◽  
Patrick Schiavone ◽  
Yves Quere
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Deep Uv ◽  
Phase Shift Mask

scholarly journals Exposure Method for Three-Dimensional Samples Using Phase Shift Mask

2006 ◽  
Vol 126 (6) ◽  
pp. 241-242
Author(s):  
Minoru Sasaki ◽  
Tanjyunjyon Edwin ◽  
Kazuhiro Hane
Keyword(s):  
Phase Shift ◽  
Three Dimensional ◽  
Exposure Method ◽  
Phase Shift Mask

0.18-μm optical lithography performances using an alternating DUV phase-shift mask

1998 ◽  
Author(s):  
Yorick Trouiller ◽  
N. Buffet ◽  
Thierry Mourier ◽  
Patrick Schiavone ◽  
Yves Quere
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Phase Shift Mask

Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography

2003 ◽  
Vol 22 (4) ◽  
pp. 361-367 ◽  
Author(s):  
Sung Kwan Kim ◽  
Myung Ah Kang ◽  
Jung Min Sohn ◽  
Songho Kim ◽  
Kwangsoo No
Keyword(s):  
Optical Properties ◽  
Phase Shift ◽  
Optical Lithography ◽  
Mask Material ◽  
Phase Shift Mask
Sign in / Sign up

Export Citation Format

Share Document