Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography

2003 ◽  
Vol 22 (4) ◽  
pp. 361-367 ◽  
Author(s):  
Sung Kwan Kim ◽  
Myung Ah Kang ◽  
Jung Min Sohn ◽  
Songho Kim ◽  
Kwangsoo No
1999 ◽  
Author(s):  
Zhijian G. Lu ◽  
Yuping Cui ◽  
Alan C. Thomas ◽  
Scott M. Mansfield ◽  
Gerhard Kunkel ◽  
...  

1991 ◽  
Author(s):  
Tsuneo Terasawa ◽  
Norio Hasegawa ◽  
Akira Imai ◽  
Toshihiko P. Tanaka ◽  
Souichi Katagiri

1998 ◽  
Vol 41-42 ◽  
pp. 61-64 ◽  
Author(s):  
Y. Trouiller ◽  
N. Buffet ◽  
T. Mourier ◽  
P. Schiavone ◽  
Y. Quere

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6714-6717 ◽  
Author(s):  
Yorick Trouiller ◽  
Nicolas Buffet ◽  
Thierry Mourier ◽  
Patrick Schiavone ◽  
Yves Quere

2020 ◽  
Vol 29 (4) ◽  
pp. 648-650
Author(s):  
Yuanfang Wu ◽  
Guangwen Bao ◽  
Lisong Dong ◽  
Yayi Wei

1998 ◽  
Author(s):  
Yorick Trouiller ◽  
N. Buffet ◽  
Thierry Mourier ◽  
Patrick Schiavone ◽  
Yves Quere

2004 ◽  
Vol 43 (5A) ◽  
pp. 2523-2529 ◽  
Author(s):  
Sung Kwan Kim ◽  
Yang Soo Kim ◽  
Young Min Choi ◽  
Jong Wan Choi ◽  
Jongin Hong ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document