Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography
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1998 ◽
Vol 41-42
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pp. 61-64
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1998 ◽
Vol 37
(Part 1, No. 12B)
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pp. 6714-6717
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1993 ◽
Vol 11
(6)
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pp. 2697
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2004 ◽
Vol 43
(5A)
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pp. 2523-2529
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