Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography

2002 ◽  
Author(s):  
SungKwan Kim ◽  
Eunchul Choi ◽  
Hyoungdo Kim ◽  
Jungmin Kim ◽  
Kwangsoo No
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Mask Material ◽  
Phase Shift Mask

Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography

2003 ◽  
Vol 22 (4) ◽  
pp. 361-367 ◽  
Author(s):  
Sung Kwan Kim ◽  
Myung Ah Kang ◽  
Jung Min Sohn ◽  
Songho Kim ◽  
Kwangsoo No
Keyword(s):  
Optical Properties ◽  
Phase Shift ◽  
Optical Lithography ◽  
Mask Material ◽  
Phase Shift Mask

Edge effects characterization of phase shift mask

2005 ◽  
Vol 23 (2) ◽  
pp. 417 ◽  
Author(s):  
Gek Soon Chua ◽  
Cho Jui Tay ◽  
Chenggen Quan ◽  
Qunying Lin
Keyword(s):  
Phase Shift ◽  
Edge Effects ◽  
Phase Shift Mask

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

1999 ◽  
Author(s):  
Zhijian G. Lu ◽  
Yuping Cui ◽  
Alan C. Thomas ◽  
Scott M. Mansfield ◽  
Gerhard Kunkel ◽  
...  
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Phase Shift Mask ◽  
Selection Of

Development and characterization of a new low stress molybdenum silicide film for 45 nm attenuated phase shift mask manufacturing

2007 ◽  
Author(s):  
Thomas Faure ◽  
Emily E. Gallagher ◽  
Louis Kindt ◽  
Steven Nash ◽  
Ken Racette ◽  
...  
Keyword(s):  
Phase Shift ◽  
Molybdenum Silicide ◽  
Silicide Film ◽  
Phase Shift Mask

Variable phase-shift mask for deep-submicron optical lithography

1991 ◽  
Author(s):  
Tsuneo Terasawa ◽  
Norio Hasegawa ◽  
Akira Imai ◽  
Toshihiko P. Tanaka ◽  
Souichi Katagiri
Keyword(s):  
Phase Shift ◽  
Deep Submicron ◽  
Optical Lithography ◽  
Variable Phase ◽  
Phase Shift Mask

Innovations in lithography metrology for characterization of phase-shift mask materials

2001 ◽  
Author(s):  
Dale A. Harrison ◽  
John C. Lam ◽  
A. Rahim Forouhi
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask

EUV attenuated phase shift mask: development and characterization of mask properties

2021 ◽  
Author(s):  
Ikuya Fukasawa ◽  
Yohei Ikebe ◽  
Takeshi Aizawa ◽  
Tsutomu Shoki ◽  
Takahiro Onoue
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask

0.12 μm optical lithography performances using an alternating DUV phase shift mask

1998 ◽  
Vol 41-42 ◽  
pp. 61-64 ◽  
Author(s):  
Y. Trouiller ◽  
N. Buffet ◽  
T. Mourier ◽  
P. Schiavone ◽  
Y. Quere
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Phase Shift Mask

0.12 µm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6714-6717 ◽  
Author(s):  
Yorick Trouiller ◽  
Nicolas Buffet ◽  
Thierry Mourier ◽  
Patrick Schiavone ◽  
Yves Quere
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Deep Uv ◽  
Phase Shift Mask
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