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Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
Mapping Intimacies
◽
10.1117/12.350280
◽
1999
◽
Cited By ~ 2
Author(s):
Zhijian G. Lu
◽
Yuping Cui
◽
Alan C. Thomas
◽
Scott M. Mansfield
◽
Gerhard Kunkel
◽
...
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Phase Shift Mask
◽
Selection Of
Download Full-text
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Cited By
References
Variable phase-shift mask for deep-submicron optical lithography
10.1117/12.44782
◽
1991
◽
Cited By ~ 3
Author(s):
Tsuneo Terasawa
◽
Norio Hasegawa
◽
Akira Imai
◽
Toshihiko P. Tanaka
◽
Souichi Katagiri
Keyword(s):
Phase Shift
◽
Deep Submicron
◽
Optical Lithography
◽
Variable Phase
◽
Phase Shift Mask
Download Full-text
Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography
10.1117/12.474558
◽
2002
◽
Cited By ~ 1
Author(s):
SungKwan Kim
◽
Eunchul Choi
◽
Hyoungdo Kim
◽
Jungmin Kim
◽
Kwangsoo No
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Mask Material
◽
Phase Shift Mask
Download Full-text
0.12 μm optical lithography performances using an alternating DUV phase shift mask
Microelectronic Engineering
◽
10.1016/s0167-9317(98)00013-6
◽
1998
◽
Vol 41-42
◽
pp. 61-64
◽
Cited By ~ 1
Author(s):
Y. Trouiller
◽
N. Buffet
◽
T. Mourier
◽
P. Schiavone
◽
Y. Quere
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Phase Shift Mask
Download Full-text
0.12 µm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask
Japanese Journal of Applied Physics
◽
10.1143/jjap.37.6714
◽
1998
◽
Vol 37
(Part 1, No. 12B)
◽
pp. 6714-6717
◽
Cited By ~ 1
Author(s):
Yorick Trouiller
◽
Nicolas Buffet
◽
Thierry Mourier
◽
Patrick Schiavone
◽
Yves Quere
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Deep Uv
◽
Phase Shift Mask
Download Full-text
A Study on Three Dimensional Mask Effect of Attenuated Phase-Shift Mask in Advanced Optical Lithography
Chinese Journal of Electronics
◽
10.1049/cje.2020.05.008
◽
2020
◽
Vol 29
(4)
◽
pp. 648-650
Author(s):
Yuanfang Wu
◽
Guangwen Bao
◽
Lisong Dong
◽
Yayi Wei
Keyword(s):
Phase Shift
◽
Three Dimensional
◽
Optical Lithography
◽
Phase Shift Mask
Download Full-text
0.12 /spl mu/m Optical Lithography Performance Using an Alternating DUV Phase Shift Mask
Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)
◽
10.1109/imnc.1998.729976
◽
1998
◽
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Phase Shift Mask
Download Full-text
0.18-μm optical lithography performances using an alternating DUV phase-shift mask
10.1117/12.310761
◽
1998
◽
Cited By ~ 2
Author(s):
Yorick Trouiller
◽
N. Buffet
◽
Thierry Mourier
◽
Patrick Schiavone
◽
Yves Quere
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Phase Shift Mask
Download Full-text
Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography
Optical Materials
◽
10.1016/s0925-3467(02)00370-1
◽
2003
◽
Vol 22
(4)
◽
pp. 361-367
◽
Cited By ~ 5
Author(s):
Sung Kwan Kim
◽
Myung Ah Kang
◽
Jung Min Sohn
◽
Songho Kim
◽
Kwangsoo No
Keyword(s):
Optical Properties
◽
Phase Shift
◽
Optical Lithography
◽
Mask Material
◽
Phase Shift Mask
Download Full-text
Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
10.1117/12.410711
◽
2001
◽
Author(s):
Sang-Sool Koo
◽
Hee-Bom Kim
◽
Hyoung-Soon Yune
◽
Jee-Suk Hong
◽
Seung-Weon Paek
◽
...
Keyword(s):
Phase Shift
◽
Optical Lithography
◽
Phase Shift Mask
Download Full-text
Relationship of phase shift mask design and size of three-dimension nanostructures
2020 27th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
◽
10.23919/am-fpd49417.2020.9224493
◽
2020
◽
Author(s):
Pongsakom Sihapitak
◽
Yasuaki Ishikawa
◽
Xudongfang Wang
◽
Mutsunori Uenuma
◽
Yukiharu Uraoka
Keyword(s):
Phase Shift
◽
Three Dimension
◽
Mask Design
◽
Relationship Of
◽
Phase Shift Mask
Download Full-text
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