scholarly journals Mechanical Properties of Optical Dielectric Thin Films Deposited by the Ion Plating Technique

1997 ◽  
Vol 8 (4-5) ◽  
pp. 251-260 ◽  
Author(s):  
Christine Mahodaux ◽  
Hervé Rigneault ◽  
Hugues Giovannini ◽  
Ludovic Escoubas ◽  
Paul Morreti
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Dielectric Thin Films ◽  
Ion Plating ◽  
Plating Technique ◽  
Optical Dielectric

Mechanical properties of dielectric thin films

1997 ◽  
Author(s):  
Herve Rigneault ◽  
Christine Mahodaux ◽  
Hugues Giovannini ◽  
Ludovic Escoubas ◽  
Paul Moretti
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Dielectric Thin Films

Enhanced Mechanical Properties of LaF3 Thin Films by Ion Plating Deposition

2011 ◽  
Vol 52 (7) ◽  
pp. 1431-1435
Author(s):  
Takanobu Hori ◽  
Shinji Motokoshi ◽  
Hiroshi Kajiyama
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Ion Plating

scholarly journals Nanoindentation of Silicate Low-K Dielectric Thin Films

2002 ◽  
Vol 716 ◽  
Author(s):  
Joseph B. Vella ◽  
Alex A. Volinsky ◽  
Indira S. Adhihetty ◽  
N.V. Edwards ◽  
William W. Gerberich
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Fracture Toughness ◽  
Dielectric Constant ◽  
Elastic Modulus ◽  
Percolation Theory ◽  
Scratch Testing ◽  
Dielectric Thin Films ◽  
Cube Corner ◽  
Low K

AbstractThe capabilities of nanoindentation to characterize low-k organo silicate glass (OSG) thin films is explored as a relatively rapid and inexpensive metric of mechanical properties, adhesion strength, and fracture toughness. One method of decreasing the static dielectric constant of OSG interlayer dielectrics requires the introduction of porosity in the material which has a dramatic impact on its mechanical and toughness properties. Percolation theory is used to formulate a correlation between porosity and elastic modulus. Using cube corner diamond indentation and scratch testing fracture toughness calculations are also discussed.

The crystallographic and electroluminescent characteristics of ZnS:Mn thin films prepared by radio frequency ion‐plating technique

1990 ◽  
Vol 8 (1) ◽  
pp. 43-48
Author(s):  
Shigeyuki Kiyota ◽  
Keiko Terai ◽  
Norifumi Kikuchi ◽  
Takuma Kojima ◽  
N. Shin‐ichi Takahashi ◽  
...  
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Ion Plating ◽  
Plating Technique
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