Over 245 mW 1.3 μm buried ridge stripe laser diodes onn‐substrate fabricated by the reactive ion beam etching technique

1991 ◽  
Vol 59 (1) ◽  
pp. 22-24 ◽  
Author(s):  
N. Bouadma ◽  
C. Kazmierski ◽  
J. Semo
Keyword(s):  
Ion Beam ◽  
Laser Diodes ◽  
Etching Technique ◽  
Ion Beam Etching ◽  
Stripe Laser ◽  
Reactive Ion Beam Etching

Reactive Ion Beam Etching and Overgrowth Process in the Fabrication of InGaN Inner Stripe Laser Diodes

1998 ◽  
Vol 37 (Part 1, No. 3B) ◽  
pp. 1470-1473 ◽  
Author(s):  
Shin-ya Nunoue ◽  
Masahiro Yamamoto ◽  
Mariko Suzuki ◽  
Chiharu Nozaki ◽  
Joji Nishio ◽  
...  
Keyword(s):  
Ion Beam ◽  
Laser Diodes ◽  
Ion Beam Etching ◽  
Stripe Laser ◽  
Reactive Ion Beam Etching

Reactive Ion Beam Etching and Overgrowth Process for Fabrication of InGaN Inner Stripe Laser Diodes

1997 ◽  
Author(s):  
Shin-ya Nunoue ◽  
Masahiro Yamamoto ◽  
Mariko Suzuki ◽  
Chiharu Nozaki ◽  
Joji Nishio ◽  
...  
Keyword(s):  
Ion Beam ◽  
Laser Diodes ◽  
Ion Beam Etching ◽  
Stripe Laser ◽  
Reactive Ion Beam Etching

650nm-Band High Power AlGaInP Visible Laser Diodes Fabricated by Reactive Ion Beam Etching Using Cl2/N2 Mixture

1996 ◽  
Author(s):  
Isao KIDOGUCHI ◽  
Hideto ADACHI ◽  
Kiyotake TANAKA ◽  
Toshiya FUKUHISA ◽  
Masaya MANNOH ◽  
...  
Keyword(s):  
High Power ◽  
Ion Beam ◽  
Laser Diodes ◽  
Ion Beam Etching ◽  
Visible Laser ◽  
Reactive Ion Beam Etching

High-Power 650-nm-Band AlGaInP Visible Laser Diodes Fabricated by Reactive Ion Beam Etching Using Cl2/N2Mixture

1997 ◽  
Vol 36 (Part 1, No. 3B) ◽  
pp. 1892-1895 ◽  
Author(s):  
Isao Kidoguchi ◽  
Hideto Adachi ◽  
Kiyotake Tanaka ◽  
Toshiya Fukuhisa ◽  
Masaya Mannoh ◽  
...  
Keyword(s):  
High Power ◽  
Ion Beam ◽  
Laser Diodes ◽  
Ion Beam Etching ◽  
Visible Laser ◽  
Reactive Ion Beam Etching

New fabrication method for 1.3‐μm GaInAsP/InP buried crescent lasers using a reactive ion beam etching technique

1987 ◽  
Vol 51 (22) ◽  
pp. 1774-1776 ◽  
Author(s):  
Akihiko Kasukawa ◽  
Masayuki Iwase ◽  
Yuji Hiratani ◽  
Narihito Matsumoto ◽  
Yoshikazu Ikegami ◽  
...  
Keyword(s):  
Ion Beam ◽  
Fabrication Method ◽  
Etching Technique ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

Reactive Ion Beam Etching Using a Selective Gallium Doping Method

1989 ◽  
Vol 28 (Part 2, No. 9) ◽  
pp. L1671-L1672
Author(s):  
Kyusaku Nishioka ◽  
Hiroaki Morimoto ◽  
Yoji Mashiko ◽  
Tadao Kato
Keyword(s):  
Ion Beam ◽  
Ion Beam Etching ◽  
Gallium Doping ◽  
Reactive Ion Beam Etching

scholarly journals High-quality Au/BIG/GGG magnetoplasmonic crystals fabricated by a combined ion-beam etching technique

2015 ◽  
Vol 5 (7) ◽  
pp. 1647 ◽  
Author(s):  
A. L. Chekhov ◽  
V. L. Krutyanskiy ◽  
V. A. Ketsko ◽  
A. I. Stognij ◽  
T. V. Murzina
Keyword(s):  
Ion Beam ◽  
High Quality ◽  
Etching Technique ◽  
Ion Beam Etching
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