High quality YBa2Cu3O7 Josephson junctions made by direct electron beam writing

1993 ◽  
Vol 63 (12) ◽  
pp. 1696-1698 ◽  
Author(s):  
S. K. Tolpygo ◽  
S. Shokhor ◽  
B. Nadgorny ◽  
J.‐Y. Lin ◽  
M. Gurvitch ◽  
...  
Keyword(s):  
Electron Beam ◽  
Josephson Junctions ◽  
High Quality

High Quality $\bf Nb/Al\mbox{--}AlO_{\ninmbi x}\mbox{--}Al/Nb$ Josephson Junctions by Electron Beam Evaporation

1994 ◽  
Vol 33 (Part 2, No. 12A) ◽  
pp. L1662-L1664 ◽  
Author(s):  
M. P. Janawadkar ◽  
R. Baskaran ◽  
K. Gireesan ◽  
Rita Saha ◽  
L. S. Vaidyanathan ◽  
...  
Keyword(s):  
Electron Beam ◽  
Josephson Junctions ◽  
Electron Beam Evaporation ◽  
High Quality

Low Temperature Deposited High Quality ITO Films Prepared by E-Beam Evaporation

1990 ◽  
Vol 187 ◽  
Author(s):  
C. S. Chang ◽  
J. C. Wang ◽  
L. C. Kuo
Keyword(s):  
Electron Beam ◽  
Low Temperature ◽  
Substrate Temperature ◽  
Optimal Condition ◽  
Deposition Rate ◽  
Oxygen Pressure ◽  
Electron Beam Evaporation ◽  
Film Properties ◽  
High Quality ◽  
Ito Films

AbstractAn electron beam evaporation method has been used to prepare tin doped indium oxide (ITO) films with 95 wt.% In2O3 and 5 wt.% SnO2 in an oxygen atmosphere. It was found that the deposition rate and oxygen pressure strongly influence the film properties when the substrate temperature was lower than 200°C. In an optimal condition, highly transparent (transmittance ˜ 90% at wavelength 570 nm) and conductive (resistivity – 3×10−4Ω-cm) films of thickness around 2000 Å at substrate temperature as low as 180°C can be obtained.

High-T/sub c/ Josephson junctions by electron beam irradiation

1993 ◽  
Vol 3 (1) ◽  
pp. 2405-2408 ◽  
Author(s):  
A.J. Pauza ◽  
A.M. Campbell ◽  
D.F. Moore ◽  
R.E. Somekh ◽  
A.N. Broers
Keyword(s):  
Electron Beam ◽  
Josephson Junctions ◽  
Electron Beam Irradiation ◽  
Beam Irradiation

Fabrication of high-quality Nb/AlOx/Nb Josephson junctions

1990 ◽  
Vol 73 (4) ◽  
pp. 83-96 ◽  
Author(s):  
Hiroyuki Mori ◽  
Mikio Hirano ◽  
Yuji Hatano ◽  
Ushio Kawabe ◽  
Hirojo Yamada ◽  
...  
Keyword(s):  
Josephson Junctions ◽  
High Quality

High quality Si/Si1−xGexlayered structures grown using a mass‐spectrometry controlled electron‐beam evaporation system

1994 ◽  
Vol 65 (14) ◽  
pp. 1772-1774 ◽  
Author(s):  
W.‐X. Ni ◽  
A. Henry ◽  
M. I. Larsson ◽  
K. Joelsson ◽  
G. V. Hansson
Keyword(s):  
Mass Spectrometry ◽  
Electron Beam ◽  
Electron Beam Evaporation ◽  
High Quality

Effects induced by electron beam irradiation on the properties of Y1Ba2Cu3O7-x biepitaxial Josephson junctions

1998 ◽  
Vol 08 (PR3) ◽  
pp. Pr3-289-Pr3-292
Author(s):  
F. Tafuri ◽  
B. Nadgorny ◽  
S. Shokhor ◽  
M. Gurvitch ◽  
F. Lombardi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Josephson Junctions ◽  
Electron Beam Irradiation ◽  
Beam Irradiation

Characterization and ellipsometric investigation of high-quality ZnO and ZnO(Ga2O3) thin alloys by reactive electron-beam co-evaporation technique

2006 ◽  
Vol 37 (10) ◽  
pp. 1080-1085 ◽  
Author(s):  
R. Al Asmar ◽  
J.-P. Atanas ◽  
Y. Zaatar ◽  
J. Podlecki ◽  
A. Foucaran
Keyword(s):  
Electron Beam ◽  
High Quality ◽  
Evaporation Technique

Barrier properties inYBa2Cu3O7−xgrain-boundary Josephson junctions using electron-beam irradiation

1998 ◽  
Vol 57 (22) ◽  
pp. R14076-R14079 ◽  
Author(s):  
F. Tafuri ◽  
B. Nadgorny ◽  
S. Shokhor ◽  
M. Gurvitch ◽  
F. Lombardi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Josephson Junctions ◽  
Electron Beam Irradiation ◽  
Barrier Properties ◽  
Beam Irradiation
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