Optical emission spectroscopy studies of the effects of nitrogen addition on diamond synthesis in a CH4–CO2 gas mixture

1995 ◽  
Vol 67 (15) ◽  
pp. 2149-2151 ◽  
Author(s):  
Tsao‐Ming Hong ◽  
Sheng‐Hsiung Chen ◽  
Yih‐Song Chiou ◽  
Chia‐Fu Chen
2010 ◽  
Vol 12 (3) ◽  
pp. 314-319 ◽  
Author(s):  
E. F Mendez-Martinez ◽  
P. G Reyes ◽  
D Osorio-Gonzalez ◽  
F Castillo ◽  
H Martinez

2014 ◽  
Vol 1035 ◽  
pp. 373-378 ◽  
Author(s):  
Yan Chao Shi ◽  
Qin Jian Zhang ◽  
Jia Jun Li ◽  
Guang Chao Chen

Ar\H2\CH4 gas mixture was utilized to grow nanocrystal diamond films in a RF plasma enhanced CVD system. CH4\ H2 ratios were changed to study the effect of plasma radicals on the deposit, in which optical emission spectroscopy (OES) was applied to analyze the plasma radicals. It was found that Hα, Hβ, Hγ, CH, C2 were the main radicals in the plasma. Among them, the CH intensity of OES was usually quite strong and increased sharply when the ratio of CH4/H2 was greater than 3%. The intensity of C2 was weak and basically unchanged with the addition of methane. This study can provide a new possible technical application for depositing NCD films.


1994 ◽  
Vol 66 (6) ◽  
pp. 1195-1205 ◽  
Author(s):  
Carsten Benndorf ◽  
Pierre Joeris ◽  
Roland Kroger

2013 ◽  
Vol 52 (1) ◽  
pp. 473-481
Author(s):  
Y.-L. Hsieh ◽  
S.-Y. Chang ◽  
T. T. Li ◽  
L.-C. Hu ◽  
C. C. Lee ◽  
...  

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