Determination of electron trap distribution in the gate–oxide region of the deep submicron metal–oxide–semiconductor structure from direct tunneling gate current

2002 ◽  
Vol 80 (12) ◽  
pp. 2123-2125 ◽  
Author(s):  
Murshed Mahmud Chowdhury ◽  
Saif uz Zaman ◽  
A. Haque ◽  
M. Rezwan Khan
Sign in / Sign up

Export Citation Format

Share Document