Order–disorder transition of anodic alumina nanochannel arrays grown under the guidance of focused-ion-beam patterning

2004 ◽  
Vol 84 (14) ◽  
pp. 2509-2511 ◽  
Author(s):  
C. Y. Liu ◽  
A. Datta ◽  
N. W. Liu ◽  
C. Y. Peng ◽  
Y. L. Wang
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Anodic Alumina ◽  
Disorder Transition ◽  
Ion Beam Patterning ◽  
Nanochannel Arrays

High-speed focused-ion-beam patterning for guiding the growth of anodic alumina nanochannel arrays

2003 ◽  
Vol 82 (8) ◽  
pp. 1281-1283 ◽  
Author(s):  
N. W. Liu ◽  
A. Datta ◽  
C. Y. Liu ◽  
Y. L. Wang
Keyword(s):  
High Speed ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Anodic Alumina ◽  
Ion Beam Patterning ◽  
Nanochannel Arrays

Focused ion beam patterning of III–V crystals at low temperature: A method for improving the ion-induced defect localization

2000 ◽  
Vol 18 (6) ◽  
pp. 3162 ◽  
Author(s):  
M. Schneider ◽  
J. Gierak ◽  
J. Y. Marzin ◽  
B. Gayral ◽  
J. M. Gérard
Keyword(s):  
Low Temperature ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Defect Localization ◽  
Ion Beam Patterning

Critical issues in the focused ion beam patterning of nanometric hole matrixes on GaAs based semiconducting devices

2006 ◽  
Vol 17 (6) ◽  
pp. 1758-1762 ◽  
Author(s):  
M Catalano ◽  
A Taurino ◽  
M Lomascolo ◽  
A Schertel ◽  
A Orchowski
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Critical Issues ◽  
Ion Beam Patterning

Focused‐Ion‐Beam‐Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements

2008 ◽  
Vol 20 (13) ◽  
pp. 2547-2551 ◽  
Author(s):  
Nai‐Wei Liu ◽  
Chih‐Yi Liu ◽  
Huai‐Hsien Wang ◽  
Chen‐Feng Hsu ◽  
Ming‐Yu Lai ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Anodic Alumina ◽  
Nanowire Arrays

A closed UHV focused ion beam patterning and MBE regrowth technique

1995 ◽  
Vol 35 (1-3) ◽  
pp. 208-213 ◽  
Author(s):  
H. Muessig ◽  
Th. Hackbarth ◽  
H. Brugger ◽  
A. Orth ◽  
J.P. Reithmaier ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Beam Patterning

scholarly journals Optimization of Focused Ion Beam Patterning Parameters for Direct Integration of Plasmonic Nanostructures on Silicon Photodiodes

2021 ◽  
Vol 10 (1) ◽  
pp. 2
Author(s):  
Elia Scattolo ◽  
Alessandro Cian ◽  
Damiano Giubertoni ◽  
Giovanni Paternoster ◽  
Luisa Petti ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Finite Difference Time Domain ◽  
Focused Ion Beam ◽  
Silver Film ◽  
Ion Beam ◽  
Plasmonic Nanostructures ◽  
Direct Integration ◽  
Active Device ◽  
Difference Time ◽  
Ion Beam Patterning

The possibility of integrating plasmonic nanostructures directly on an active device, such as a silicon photodetector, is a challenging task of interest in many applications. Among the available nanofabrication techniques to realize plasmonic nanostructures, Focused Ion Beam (FIB) is surely the most promising, even if it is characterized by certain limitations, such as ion implantation in the substrate. In this work, we demonstrate the direct integration of plasmonic nanostructures directly on an active Si-photodetector by patterning a silver film with FIB. To avoid ion implantation and to therefore guarantee unaltered device behavior, both the patterning parameters and the geometry of the nanostructures were implemented by Montecarlo and Finite-Difference Time-Domain simulations.

Strategies for gallium removal after focused ion beam patterning of ferroelectric oxide nanostructures

2007 ◽  
Vol 18 (3) ◽  
pp. 035301 ◽  
Author(s):  
A Schilling ◽  
T Adams ◽  
R M Bowman ◽  
J M Gregg
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Oxide Nanostructures ◽  
Ion Beam Patterning ◽  
Ferroelectric Oxide

Focused Ion Beam Patterning of High T c Superconductor Films

1989 ◽  
Author(s):  
L. R. Harriott ◽  
P. A. Polakos
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Superconductor Films ◽  
Ion Beam Patterning
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