Fabrication of three dimensional porous silicon distributed Bragg reflectors

2008 ◽  
Vol 93 (22) ◽  
pp. 221905 ◽  
Author(s):  
D. Mangaiyarkarasi ◽  
M. B. H. Breese ◽  
Y. S. Ow
Author(s):  
F. Morales ◽  
G. Garcia ◽  
A. Luna ◽  
R. Lopez ◽  
E. Rosendo ◽  
...  

2008 ◽  
Vol 16 (17) ◽  
pp. 12757 ◽  
Author(s):  
D. Mangaiyarkarasi ◽  
Ow Y. Sheng ◽  
Mark B. Breese ◽  
Vincent L. Fuh ◽  
Eric T. Xioasong

2005 ◽  
Vol 10 (1) ◽  
pp. 83-91 ◽  
Author(s):  
N. Samuolienė ◽  
E. Šatkovskis

Herein, the problem of nanocrystaline silicon laser and its importance in microelectronics are discussed upon. The features of vertical Fabry-Perot microcavities made on the base of porous silicon are described. The responses of the reflectivity of the distributed reflection Bragg mirrors and Fabry-Perot microcavities were found using transfer matrixes method for this purpose. Inherent optical parameters of porous silicon, deposited by electrochemical etch, were used in the calculations. The calculation of the reflectivity of the distributed reflection Bragg mirrors with front active layer of nanostructural porous silicon had been examined. In the second part, the features of Fabry-Perot microcavities on variation of the number of layers of the front or rear mirrors are described. The impact of the thickness of the active nanocrystaline silicon spacer between two distributed reflection Bragg mirrors upon the spectra of optical reflectivity of Fabry-Perot microcavities in the wavelength range of 0.4–0.9 µm had been examined as well. The made conclusions are important for improvement of the thickness of the active porous silicon spacer in front of Bragg mirror and the features of Fabry-Perot microcavities.


2007 ◽  
Vol 7 (11) ◽  
pp. 4165-4168
Author(s):  
Jihoon Kim ◽  
Youngdae Koh ◽  
Seunghyun Jang ◽  
Young Chun Ko ◽  
Hee-Gweon Woo ◽  
...  

Well defined 1-dimentional (1-D) photonic crystals of polymer replicas have been successfully obtained. DBR porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p++-type silicon wafer. The resulting DBR porous silicon film removed from the substrate by applying an electropolishing current has been thermally oxidized in the furnace at 400 °C for 3 h. Oxidized DBR PSi/polystyrene composite films are prepared by casting of polymer solution onto a free-standing porous silicon photonic crystal layer. Flexible photonic polymer replicas have been prepared after the removal of oxidized DBR PSi matrix in HF/H2O mixture solution. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replica indicate that the surface of polymer film has a negative structure of DBR PSi. This replica is stable in aqueous solutions for several days without any degradation.


2003 ◽  
Vol 797 ◽  
Author(s):  
J. Diener ◽  
N. Künzner ◽  
E. Gross ◽  
D. Kovalev ◽  
M. Fujii

ABSTRACTAnisotropic nanostructuring of bulk silicon (Si) leads to a significant optical anisotropy of single porous silicon (PSi) layers. A variation of the etching current in time allows a controlled modification of the porosity along the growth direction and therefore a three-dimensional variation of the refractive index (in plane an in depth). This technique can be important for photonic applications since it is the basis of a development of a variety of novel, polarization sensitive, silicon-based optical devices: retarders, dichroic Bragg Reflectors, dichroic microcavities and Si based polarizers.


2007 ◽  
Vol 102 (6) ◽  
pp. 063111 ◽  
Author(s):  
E. Xifré-Pérez ◽  
L. F. Marsal ◽  
J. Ferré-Borrull ◽  
J. Pallarès

2007 ◽  
Vol 7 (11) ◽  
pp. 4165-4168 ◽  
Author(s):  
Jihoon Kim ◽  
Youngdae Koh ◽  
Seunghyun Jang ◽  
Young Chun Ko ◽  
Hee-Gweon Woo ◽  
...  

Well defined 1-dimentional (1-D) photonic crystals of polymer replicas have been successfully obtained. DBR porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p++-type silicon wafer. The resulting DBR porous silicon film removed from the substrate by applying an electropolishing current has been thermally oxidized in the furnace at 400 °C for 3 h. Oxidized DBR PSi/polystyrene composite films are prepared by casting of polymer solution onto a free-standing porous silicon photonic crystal layer. Flexible photonic polymer replicas have been prepared after the removal of oxidized DBR PSi matrix in HF/H2O mixture solution. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replica indicate that the surface of polymer film has a negative structure of DBR PSi. This replica is stable in aqueous solutions for several days without any degradation.


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