How to measure forces with atomic force microscopy without significant influence from nonlinear optical lever sensitivity

2009 ◽  
Vol 80 (9) ◽  
pp. 093701 ◽  
Author(s):  
Esben Thormann ◽  
Torbjön Pettersson ◽  
Per M. Claesson
Keyword(s):  
Atomic Force Microscopy ◽  
Significant Influence ◽  
Nonlinear Optical ◽  
Force Microscopy ◽  
Atomic Force ◽  
Optical Lever

Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission

1998 ◽  
Vol 509 ◽  
Author(s):  
A.N. Titkov ◽  
A.I. Kosarev ◽  
A.J. Vinogradov ◽  
Z. Waqar ◽  
I.V. Makarenko ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Low Temperature ◽  
Field Emission ◽  
Significant Influence ◽  
Substrate Surface ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

AbstractThe effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.

Metasurface-enhanced optical lever sensitivity for atomic force microscopy

2019 ◽  
Vol 30 (36) ◽  
pp. 365501 ◽  
Author(s):  
Zan Yao ◽  
Xicheng Xia ◽  
Yaoping Hou ◽  
Peng Zhang ◽  
Xiaomin Zhai ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Optical Lever
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