Stoichiometric analysis of compositionally graded combinatorial amorphous thin film oxides using laser-induced breakdown spectroscopy

2010 ◽  
Vol 81 (7) ◽  
pp. 073103 ◽  
Author(s):  
N. Edwin Widjonarko ◽  
John D. Perkins ◽  
Jennifer E. Leisch ◽  
Philip A. Parilla ◽  
Calvin J. Curtis ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Induced Breakdown Spectroscopy ◽  
Amorphous Thin Film ◽  
Stoichiometric Analysis ◽  
Breakdown Spectroscopy ◽  
Laser Induced Breakdown ◽  
Thin Film Oxides

Ultrafast thin-film laser-induced breakdown spectroscopy of doped oxides

2010 ◽  
Vol 49 (13) ◽  
pp. C67 ◽  
Author(s):  
Travis Owens ◽  
Samuel S. Mao ◽  
Erin K. Canfield ◽  
Costas P. Grigoropoulos ◽  
Xianglei Mao ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Induced Breakdown Spectroscopy ◽  
Breakdown Spectroscopy ◽  
Laser Induced Breakdown

Analysis of relative standard deviation of spectral line intensity and intensity ratio in laser-induced breakdown spectroscopy using CuIn1−xGaxSe2 thin film samples

2015 ◽  
Vol 30 (10) ◽  
pp. 2107-2119 ◽  
Author(s):  
Jung-Hwan In ◽  
Chan-Kyu Kim ◽  
Sungho Jeong
Keyword(s):  
Thin Film ◽  
Standard Deviation ◽  
Spectral Line ◽  
Line Intensity ◽  
Laser Induced Breakdown Spectroscopy ◽  
Spectral Line Intensity ◽  
Breakdown Spectroscopy ◽  
Relative Standard ◽  
Laser Induced Breakdown ◽  
Fluctuation Noise

The precision of laser induced breakdown spectroscopy (LIBS) measurement is analyzed in consideration of both the shot noise of the detector and the shot-to-shot fluctuation noise of the laser plasma.

Calibration-free quantitative analysis of thin-film oxide layers in semiconductors using laser induced breakdown spectroscopy (LIBS)

2017 ◽  
Vol 32 (7) ◽  
pp. 1378-1387 ◽  
Author(s):  
Seyyed Ali Davari ◽  
Sheng Hu ◽  
Ravi Pamu ◽  
Dibyendu Mukherjee
Keyword(s):  
Thin Film ◽  
Quantitative Analysis ◽  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Laser Induced Breakdown Spectroscopy ◽  
Oxide Layers ◽  
Breakdown Spectroscopy ◽  
Laser Induced Breakdown ◽  
Calibration Free

Calibration-free LIBS for quantitative analysis of thin film layers for metal oxide semiconductor (MOS) applications.

Application of Laser-induced Breakdown Spectroscopy to Analysis of Thin-film Damage

2016 ◽  
Vol 45 (4) ◽  
pp. 414004
Author(s):  
葛锦蔓 GE Jin-man ◽  
苏俊宏 SU Jun-hong ◽  
徐均琪 XU Jun-qi ◽  
陈磊 CHEN Lei ◽  
吕宁 LV Ning ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Induced Breakdown Spectroscopy ◽  
Breakdown Spectroscopy ◽  
Laser Induced Breakdown
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