Charged particle activation analysis study of the oxygen outdiffusion from Czochralski‐grown silicon during classical and rapid thermal annealing in various gas ambient

1993 ◽  
Vol 74 (10) ◽  
pp. 6115-6119 ◽  
Author(s):  
C. Maddalon‐Vinante ◽  
D. Barbier ◽  
H. Erramli ◽  
G. Blondiaux
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