The Evaluation Effect of the Active Lubricating Coating on the Mechanical Properties of Stamped Semi-Finished Products Made of Refractory Metals

We investigated the possibility of using an organofluorine coating on parts of the "Screen" type made by cold stamping from refractory metals, in particular niobium. The paper also presents the results of a study of the mechanical characteristics of samples with acoustic-emission accompaniment and the hardness values before and after applying the organofluorine composition. The surface of parts with and without coating after convolution is studied. It is shown that it is possible to prevent loss of stability during the first operation of the technological process, as well as to reduce the number of operations by eliminating annealing between subsequent operations of drawing with thinning.

Numerical Study of a Wide-angle Near-Perfect Absorber for the Visible Regime Incorporating Metal-Dielectric-Metal Subwavelength Grating Structure

A near-perfect absorber for the visible regime based on metal-dielectric-metal subwavelength grating structure with the refractory metals is designed and demonstrated numerically. The absorber presents an average absorption over 98.4% in the visible regime at normal incidence. Angle-relative analysis shows that the proposed structure has good angle-tolerance. The high average absorption (86.6%) in the visible region can be maintained with the incident angles up to 60°. Through the analysis of the magnetic field, the physical origin is verified that this excellent absorption performance mainly stems from the cooperative effect of surface plasmonic resonances and the intrinsic broadband spectral responses by the refractory metals. In addition, the dependence of the absorption spectrum of the proposed absorber on the structural parameters is analyzed. This work provides an idea for the design of high-performance absorbers and has potential applications in advanced light energy capture and integration systems.

Low-Field Electron Emission Capability of Thin Films on Flat Silicon Substrates: Experiments with Mo and General Model for Refractory Metals and Carbon

Herein, we describe a study of the phenomenon of field-induced electron emission from thin films deposited on flat Si substrates. Films of Mo with an effective thickness of 6–10 nm showed room-temperature low-field emissivity; a 100 nA current was extracted at macroscopic field magnitudes as low as 1.4–3.7 V/μm. This result was achieved after formation treatment of the samples by combined action of elevated temperatures (100–600 °C) and the electric field. Morphology of the films was assessed by AFM, SEM, and STM/STS methods before and after the emission tests. The images showed that forming treatment and emission experiments resulted in the appearance of numerous defects at the initially continuous and smooth films; in some regions, the Mo layer was found to consist of separate nanosized islets. Film structure reconstruction (dewetting) was apparently induced by emission-related factors, such as local heating and/or ion irradiation. These results were compared with our previous data obtained in experiments with carbon islet films of similar average thickness deposited onto identical substrates. On this basis, we suggest a novel model of emission mechanism that might be common for thin films of carbon and refractory metals. The model combines elements of the well-known patch field, multiple barriers, and thermoelectric models of low-macroscopic-field electron emission from electrically nanostructured heterogeneous materials.