Angular and energy distribution of Sn ion debris ejected from a laser-produced plasma source, for laser power densities in the range suitable for extreme ultraviolet lithography

2011 ◽  
Vol 109 (7) ◽  
pp. 073301 ◽  
Author(s):  
A. O’Connor ◽  
O. Morris ◽  
E. Sokell
Keyword(s):  
Energy Distribution ◽  
Laser Power ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma ◽  
Power Densities

Tin laser-produced plasma source modeling at 13.5nm for extreme ultraviolet lithography

2008 ◽  
Vol 92 (15) ◽  
pp. 151501 ◽  
Author(s):  
J. White ◽  
G. O’Sullivan ◽  
S. Zakharov ◽  
P. Choi ◽  
V. Zakharov ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Extreme Ultraviolet Lithography ◽  
Source Modeling ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-produced plasma light source for extreme ultraviolet lithography

2013 ◽  
Vol 6 (1) ◽  
pp. 20-33
Author(s):  
窦银萍 DOU Yin-ping ◽  
孙长凯 SUN Chang-kai ◽  
林景全 LIN Jing-quan
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography

2020 ◽  
Vol 13 (1) ◽  
pp. 28-42
Author(s):  
宗 楠 ZONG Nan ◽  
胡蔚敏 HU Wei-min ◽  
王志敏 WANG Zhi-min ◽  
王小军 WANG Xiao-jun ◽  
张申金 ZHANG Shen-jin ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Research Progress ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3707-3712 ◽  
Author(s):  
Hiroshi Komori ◽  
Georg Soumagne ◽  
Tamotsu Abe ◽  
Takashi Suganuma ◽  
Yousuke Imai ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-produced-plasma light source development for extreme ultraviolet lithography

2003 ◽  
Vol 21 (6) ◽  
pp. 2843 ◽  
Author(s):  
Hiroshi Komori ◽  
Tamotsu Abe ◽  
Takashi Suganuma ◽  
Yousuke Imai ◽  
Yukihiko Sugimoto ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma
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