scholarly journals Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

2012 ◽  
Vol 11 (2) ◽  
pp. 021109-1 ◽  
Author(s):  
Toshihisa Tomie
Keyword(s):  
Light Source ◽  
Present Status ◽  
Extreme Ultraviolet ◽  
High Volume ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma ◽  
Manufacturing History ◽  
Ideal Plasma

Laser-produced plasma light source for extreme ultraviolet lithography

2013 ◽  
Vol 6 (1) ◽  
pp. 20-33
Author(s):  
窦银萍 DOU Yin-ping ◽  
孙长凯 SUN Chang-kai ◽  
林景全 LIN Jing-quan
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography

2020 ◽  
Vol 13 (1) ◽  
pp. 28-42
Author(s):  
宗 楠 ZONG Nan ◽  
胡蔚敏 HU Wei-min ◽  
王志敏 WANG Zhi-min ◽  
王小军 WANG Xiao-jun ◽  
张申金 ZHANG Shen-jin ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Research Progress ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3707-3712 ◽  
Author(s):  
Hiroshi Komori ◽  
Georg Soumagne ◽  
Tamotsu Abe ◽  
Takashi Suganuma ◽  
Yousuke Imai ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-produced-plasma light source development for extreme ultraviolet lithography

2003 ◽  
Vol 21 (6) ◽  
pp. 2843 ◽  
Author(s):  
Hiroshi Komori ◽  
Tamotsu Abe ◽  
Takashi Suganuma ◽  
Yousuke Imai ◽  
Yukihiko Sugimoto ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-produced plasma light source for extreme-ultraviolet lithography applications

2012 ◽  
Vol 11 (2) ◽  
pp. 021114-1 ◽  
Author(s):  
Reza S. Abhari ◽  
Bob Rollinger ◽  
Andrea Z. Giovannini ◽  
Oran Morris ◽  
Ian Henderson ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-produced plasma light source for extreme ultraviolet lithography

2002 ◽  
Vol 90 (10) ◽  
pp. 1689-1695 ◽  
Author(s):  
H. Shields ◽  
S.W. Fornaca ◽  
M.B. Petach ◽  
R.A. Orsini ◽  
R.H. Moyer ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Development of element technologies for EUVL

2015 ◽  
Vol 4 (4) ◽  
Author(s):  
Hiroo Kinoshita ◽  
Takeo Watanabe ◽  
Tetsuo Harada
Keyword(s):  
Extreme Ultraviolet ◽  
Random Access ◽  
High Volume ◽  
Development Stage ◽  
Extreme Ultraviolet Lithography ◽  
Applied Physics ◽  
Reflectivity Measurement ◽  
Ultraviolet Lithography ◽  
Mask Inspection ◽  
The University

AbstractThirty years have passed since the first report on extreme ultraviolet lithography (EUVL) was presented at the annual meeting of the Japanese Society of Applied Physics in 1986. This technology is now in the manufacturing development stage. The high-volume manufacturing of dynamic-random-access-memory (DRAM) chips with a line width of 15 nm is expected in 2016. However, there are critical development issues that remain: generating a stand-alone EUV source with a higher power and producing a mask inspection tool for obtaining zero-defect masks. The Center for EUVL at the University of Hyogo was established in 2010. At present, it utilizes various types of equipment, such as an EUV mask defect inspection tool, an interference-lithography system, a device for measuring the thickness of carbon contamination film deposited by resist outgassing, and reflectivity measurement systems.

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