Atomic layer deposition of photoactive CoO/SrTiO3 and CoO/TiO2 on Si(001) for visible light driven photoelectrochemical water oxidation

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

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Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

Chemical Communications ◽

10.1039/c6cc03411j ◽

2016 ◽

Vol 52 (57) ◽

pp. 8806-8809 ◽

Cited By ~ 32

Author(s):

Peng Zhang ◽

Tuo Wang ◽

Jinlong Gong

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Water Oxidation ◽

Surface States ◽

Atomic Layer ◽

Layer Deposition ◽

Photoelectrochemical Water Oxidation

This paper describes the fabrication of TiO2 overlayers by atomic layer deposition to passivate the surface states on Ta3N5 thin film anodes for photoelectrochemical water oxidation.

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Visible light-driven g-C3N4@ZnO heterojunction photocatalyst synthesized via atomic layer deposition with a specially designed rotary reactor

Applied Surface Science ◽

10.1016/j.apsusc.2019.05.035 ◽

2019 ◽

Vol 487 ◽

pp. 206-210 ◽

Cited By ~ 15

Author(s):

Eunyong Jang ◽

Dae Woong Kim ◽

Seong Hwan Hong ◽

Young Min Park ◽

Tae Joo Park

Keyword(s):

Atomic Layer Deposition ◽

Visible Light ◽

Atomic Layer ◽

Layer Deposition ◽

Visible Light Driven ◽

Rotary Reactor

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Atomic Layer Deposition of Epitaxial Iron Oxides for Photoelectrochemical Water Oxidation

ECS Meeting Abstracts ◽

10.1149/ma2015-02/43/1719 ◽

2015 ◽

Keyword(s):

Atomic Layer Deposition ◽

Iron Oxides ◽

Water Oxidation ◽

Atomic Layer ◽

Layer Deposition ◽

Photoelectrochemical Water Oxidation

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Highly Enhanced Visible-Light-Driven Photoelectrochemical Performance of ZnO-Modified In2S3 Nanosheet Arrays by Atomic Layer Deposition

Nano-Micro Letters ◽

10.1007/s40820-018-0199-z ◽

2018 ◽

Vol 10 (3) ◽

Cited By ~ 30

Author(s):

Ming Li ◽

Xinglong Tu ◽

Yunhui Wang ◽

Yanjie Su ◽

Jing Hu ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Visible Light ◽

Atomic Layer ◽

Photoelectrochemical Performance ◽

Layer Deposition ◽

Nanosheet Arrays ◽

Visible Light Driven

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Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2 on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽

10.1039/c4nr07377k ◽

2015 ◽

Vol 7 (18) ◽

pp. 8584-8592 ◽

Cited By ~ 12

Author(s):

Isvar A. Cordova ◽

Qing Peng ◽

Isa L. Ferrall ◽

Adam J. Rieth ◽

Paul G. Hoertz ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Tin Oxide ◽

Water Oxidation ◽

Atomic Layer ◽

Solution Processing ◽

Nanoparticle Films ◽

Layer Deposition ◽

Oxide Nanoparticle ◽

Conversion Efficiencies ◽

Photoelectrochemical Water Oxidation

In this study, nanostructured photoanodes with heightened photoelectrochemical conversion efficiencies were synthesized by atomic layer deposition (ALD) of TiO2 onto a fluorine-doped tin oxide nanoparticle (nanoFTO) scaffold fabricated by solution processing.

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Improving the photodetection and stability of a visible-light QDs/ZnO phototransistor via an Al2O3 additional layer

Journal of Materials Chemistry C ◽

10.1039/d0tc05626j ◽

2021 ◽

Author(s):

Sungho Park ◽

Byung Jun Kim ◽

Tae Yeon Kim ◽

Eui Young Jung ◽

Kyu-Myung Lee ◽

...

Keyword(s):

Zinc Oxide ◽

Atomic Layer Deposition ◽

Quantum Dot ◽

Aluminum Oxide ◽

Thin Layer ◽

Visible Light ◽

Atomic Layer ◽

Zno Films ◽

Additional Layer ◽

Layer Deposition

We have developed a visible-light phototransistor with excellent photodetection characteristics and stability via atomic layer deposition (ALD) to add a thin layer of aluminum oxide (Al2O3) to quantum dot (QD)/zinc oxide (ZnO) films.

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