Growth mechanism of atomic layer deposition of zinc oxide: A density functional theory approach

2013 ◽  
Vol 103 (25) ◽  
pp. 251906 ◽  
Author(s):  
Amir Afshar ◽  
Kenneth C. Cadien
Keyword(s):  
Density Functional Theory ◽  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Density Functional ◽  
Atomic Layer ◽  
Theory Approach ◽  
Functional Theory ◽  
Layer Deposition

The Competitive Reactions in Atomic Layer Deposition of HfO2, ZrO2 and Al2O3 on Hydroxylated Si(100) Surfaces: A Density Functional Theory Study

2011 ◽  
Vol 675-677 ◽  
pp. 1249-1252
Author(s):  
Jie Ren ◽  
Guang Fen Zhou
Keyword(s):  
Density Functional Theory ◽  
Atomic Layer Deposition ◽  
Density Functional ◽  
Surface Reactions ◽  
Atomic Layer ◽  
Density Functional Theory Study ◽  
Geometrical Structures ◽  
Functional Theory ◽  
Competitive Reactions ◽  
Layer Deposition

The competitive reactions in atomic layer deposition (ALD) of HfO2, ZrO2 and Al2O3 on the hydroxylated Si(100) surfaces are investigated by using density functional theory. The surface reactions in ALD of HfO2 and ZrO2 show large similarities in energetics and geometrical structures. However, both of them show discrepancies with the surface reactions in ALD of Al2O3. In addition, by comparing with the self-termination reactions, we could find that the further growth reactions are both kinetically and thermodynamically more favorable in ALD of HfO2, ZrO2 and Al2O3.

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