Large area nano-patterning /writing on gold substrate using dip – pen nanolithography (DPN)

2014 ◽  
Author(s):  
Sudhir Kumar Saini ◽  
Amit Vishwakarma ◽  
Pankaj B. Agarwal ◽  
Bala Pesala ◽  
Ajay Agarwal
2018 ◽  
Vol 6 (17) ◽  
pp. 4649-4657 ◽  
Author(s):  
Kaiwei Li ◽  
Nan Zhang ◽  
Ting Zhang ◽  
Zhe Wang ◽  
Ming Chen ◽  
...  

Large-area nano-patterning on ultra-thin substrates through mechanical stretching for ultra-flexible and conformal sensors.


2015 ◽  
Vol 7 (34) ◽  
pp. 18899-18903 ◽  
Author(s):  
Yen-Ming Chen ◽  
Yu-Yen Lai ◽  
Yu-Chiang Chao ◽  
Hsiao-Wen Zan ◽  
Hsin-Fei Meng ◽  
...  

2015 ◽  
Vol 2 (1) ◽  
Author(s):  
Soma Biswas ◽  
Falko Brinkmann ◽  
Michael Hirtz ◽  
Harald Fuchs

AbstractWe present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.


2012 ◽  
Vol 116 (21) ◽  
pp. 11728-11733 ◽  
Author(s):  
Yong Suk Oh ◽  
Kyung Heon Lee ◽  
Hyunki Kim ◽  
Duk Young Jeon ◽  
Seung Hwan Ko ◽  
...  

2015 ◽  
Vol 57 ◽  
pp. 171-180 ◽  
Author(s):  
A. Calborean ◽  
F. Martin ◽  
D. Marconi ◽  
R. Turcu ◽  
I.E. Kacso ◽  
...  

Nanophotonics ◽  
2019 ◽  
Vol 8 (3) ◽  
pp. 505-512 ◽  
Author(s):  
Xiaoping Huang ◽  
Kai Chen ◽  
Mingxi Qi ◽  
Peifeng Zhang ◽  
Yu Li ◽  
...  

AbstractNano-patterned colloidal plasmonic metasurfaces are capable of manipulation of light at the subwavelength scale. However, achieving controllable lithography-free nano-patterning for colloidal metasurfaces still remains a major challenge, limiting their full potential in building advanced plasmonic devices. Here, we demonstrate plasmonic field guided patterning (PFGP) of ordered colloidal metallic nano-patterns using orthogonal laser standing evanescent wave (LSEW) fields. We achieved colloidal silver nano-patterns with a large area of 30 mm2 in <10 min by using orthogonal LSEW fields with a non-focused ultralow fluence irradiation of 0.25 W cm−2. The underlying mechanism of the formation of the nano-patterns is the light-induced polarization of the nanoparticles (NPs), which leads to a dipole-dipole interaction for stabilizing the nano-pattern formation, as confirmed by polarization-dependent surface-enhanced Raman spectroscopy. This optical field-directed self-assembly of NPs opens an avenue for designing and fabricating reconfigurable colloidal nano-patterned metasurfaces in large areas.


Micromachines ◽  
2017 ◽  
Vol 8 (1) ◽  
pp. 13 ◽  
Author(s):  
Li Lin ◽  
Yiyu Ou ◽  
Martin Aagesen ◽  
Flemming Jensen ◽  
Berit Herstrøm ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document