Bernal stacking-assisted shear exfoliation of nanoplate bilayers

2018 ◽  
Vol 148 (21) ◽  
pp. 214905
Author(s):  
Inhyuk Jang ◽  
Bong June Sung
Keyword(s):  
2014 ◽  
Vol 2014 ◽  
pp. 1-5 ◽  
Author(s):  
Zan Wang ◽  
Kedong Bi ◽  
Huawei Guan ◽  
Jiong Wang

Using nonequilibrium molecular dynamics, we investigate the mechanisms of thermal transport across SiC/graphene sheets. In simulations, 3C-, 4H-, and 6H-SiC are considered separately. Interfacial thermal resistances between Bernal stacking graphene sheets and SiC (Si- or C-terminated) are calculated at the ranges of 100 K~700 K. The results indicate, whether Si-terminated or C-terminated interface, the interfacial thermal resistances of 4H- and 6H-SiC have similar trends over temperatures. Si-terminated interfacial thermal resistances of 3C-SiC are higher than those of 4H- and 6H-SiC in a wide temperature range from 100 K to 600 K. But, for C-rich interface, this range is reduced from 350 K to 500 K.


2014 ◽  
Vol 4 (1) ◽  
Author(s):  
Leif I. Johansson ◽  
Rickard Armiento ◽  
Jose Avila ◽  
Chao Xia ◽  
Stephan Lorcy ◽  
...  

ACS Nano ◽  
2013 ◽  
Vol 7 (8) ◽  
pp. 7287-7294 ◽  
Author(s):  
Lei Gong ◽  
Robert J. Young ◽  
Ian A. Kinloch ◽  
Sarah J. Haigh ◽  
Jamie H. Warner ◽  
...  

2008 ◽  
Vol 78 (11) ◽  
Author(s):  
Y. C. Huang ◽  
C. P. Chang ◽  
M. F. Lin

2014 ◽  
Vol 4 (1) ◽  
Author(s):  
Leif I. Johansson ◽  
Rickard Armiento ◽  
Jose Avila ◽  
Chao Xia ◽  
Stephan Lorcy ◽  
...  

2013 ◽  
Vol 4 (1) ◽  
Author(s):  
Wenjing Zhang ◽  
Jiaxu Yan ◽  
Chang-Hsiao Chen ◽  
Liu Lei ◽  
Jer-Lai Kuo ◽  
...  

Nanoscale ◽  
2017 ◽  
Vol 9 (12) ◽  
pp. 4191-4195 ◽  
Author(s):  
Gyouil Jeong ◽  
Boogeon Choi ◽  
Deok-Soo Kim ◽  
Seongjin Ahn ◽  
Baekwon Park ◽  
...  

2018 ◽  
Vol 54 (69) ◽  
pp. 9607-9610 ◽  
Author(s):  
Nataliya Kalashnyk ◽  
Maud Jaouen ◽  
Céline Fiorini-Debuisschert ◽  
Ludovic Douillard ◽  
André-Jean Attias ◽  
...  

We show the influence of the material beneath the single atomic layer of graphene on the electronic properties of adsorbed aromatic molecules.


2013 ◽  
Vol 2013 ◽  
pp. 1-7 ◽  
Author(s):  
Hatef Sadeghi ◽  
Daniel T. H. Lai ◽  
Jean-Michel Redoute ◽  
Aladin Zayegh

Our focus in this study is on characterizing the capacitance voltage (C-V) behavior of Bernal stacking bilayer graphene (BG) and trilayer graphene (TG) as the channel of FET devices. The analytical models of quantum capacitance (QC) of BG and TG are presented. Although QC is smaller than the classic capacitance in conventional devices, its contribution to the total metal oxide semiconductor capacitor in graphene-based FET devices becomes significant in the nanoscale. Our calculation shows that QC increases with gate voltage in both BG and TG and decreases with temperature with some fluctuations. However, in bilayer graphene the fluctuation is higher due to its tunable band structure with external electric fields. In similar temperature and size, QC in metal oxide BG is higher than metal oxide TG configuration. Moreover, in both BG and TG, total capacitance is more affected by classic capacitance as the distance between gate electrode and channel increases. However, QC is more dominant when the channel becomes thinner into the nanoscale, and therefore we mostly deal with quantum capacitance in top gate in contrast with bottom gate that the classic capacitance is dominant.


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