Growth of ultrapure and Si‐doped InP by low pressure metalorganic chemical vapor deposition

1985 ◽  
Vol 46 (5) ◽  
pp. 476-478 ◽  
Author(s):  
M. A. Di Forte‐Poisson ◽  
C. Brylinski ◽  
J. P. Duchemin
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Si Doped ◽  
Metalorganic Chemical

GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition

1998 ◽  
Vol 3 ◽  
Author(s):  
P. Kung ◽  
A. Saxler ◽  
D. Walker ◽  
A. Rybaltowski ◽  
Xiaolong Zhang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Quantum Well ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Multi Quantum Well ◽  
Metalorganic Chemical

We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 μm long cavity length laser was 1.4 kA/cm2 with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively.

Photoluminescence studies in CuAlSe2epilayers grown by low‐pressure metalorganic chemical‐vapor deposition

1995 ◽  
Vol 77 (3) ◽  
pp. 1225-1232 ◽  
Author(s):  
S. Chichibu ◽  
S. Shirakata ◽  
S. Isomura ◽  
Y. Harada ◽  
M. Uchida ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Photoluminescence Studies ◽  
Metalorganic Chemical
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