scholarly journals Validating the representativeness assumption of the quasi-induced exposure method using a national representative field observation survey

2021 ◽  
Vol 22 (2) ◽  
pp. 133-138
Author(s):  
Sijun Shen ◽  
Shan Bao ◽  
Motao Zhu
Author(s):  
Selly Veronica ◽  
Nurlisa Ginting ◽  
AmyMarisa

Night tourism development comes up as an innovative strategy for tourism development in this current intense competition. There are four main elements in night tourism, namely economic, social, environmental, and night atmosphere. Berastagi is the most popular tourist destination in Karo Regency, Sumatera Utara, Indonesia, which already have night tourism destination but unfortunately undeveloped yet. Night tourism development in Berastagi must be with the local wisdom approach to maximize its benefit. Karonese as the majority ethnic of the local community in this area potential to be developed on its night tourism. This paper only analyzes the environmental and night atmosphere aspects in Berastagi’s night tourism, which based on local wisdom. Qualitative primary data from field observation and depth interview results have been analyzed by using the descriptive method. The study shows that involving local wisdom in developing the environment and night atmosphere can give the typical identity for the night tourism in Berastagi.Night Tourism


2003 ◽  
Vol 766 ◽  
Author(s):  
Vineet Sharma ◽  
Arief B. Suriadi ◽  
Frank Berauer ◽  
Laurie S. Mittelstadt

AbstractNormal photolithography tools have focal depth limitations and are unable to meet the expectations of high resolution photolithography on highly topographic structures. This paper shows a cost effective and promising technique of combining two different approaches to achieve critical dimensions of traces on slope pattern continuity on highly topographic structures. Electrophoretically deposited photoresist is used on 3-D structured wafers. This photoresist coating technique is fairly known in the MEMS industries to achieve uniform and conformal photoresist films on 3D surfaces. Multi step exposures are used to expose electrophoretically deposited photoresist. AlCu (Cu-0.5%), 0.47-0.53 μm thick metal film is deposited on 3D structured silicon substrate to plate photoresist. By combining these two novel methods, metal (AlCu) traces of 75 μm line width and 150 μm pitch (from top flat to down the slope) have been demonstrated on isotropically etched 350 μm deep trenches with 5-10% line width loss.


Author(s):  
Akinori OZAKI ◽  
Panitan KAEWJANTAWEE ◽  
Monton ANONGPONYOSKUL ◽  
Nguyen Van THINH ◽  
Masayoshi HARADA ◽  
...  

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