C-axis Oriented AlN Thin Films on Silicon Prepared by Ultrahigh Vacuum Evaporation of Al Combined with Post-Nitridation

1998 ◽  
Vol 15 (10) ◽  
pp. 732-733 ◽  
Author(s):  
Ji-po Huang ◽  
Lian-wei Wang ◽  
Qin-wo Shen ◽  
Jian-xia Gao ◽  
Ru-shan Ni ◽  
...  
Keyword(s):  
Thin Films ◽  
Ultrahigh Vacuum ◽  
Vacuum Evaporation

Epitaxial growth of superconducting niobium thin films by ultrahigh vacuum evaporation

1986 ◽  
Vol 4 (3) ◽  
pp. 524-527 ◽  
Author(s):  
S. A. Wolf ◽  
S. B. Qadri ◽  
J. H. Claassen ◽  
T. L. Francavilla ◽  
B. J. Dalrymple
Keyword(s):  
Thin Films ◽  
Epitaxial Growth ◽  
Ultrahigh Vacuum ◽  
Vacuum Evaporation

Synthesis And Structural Studies Of CdTe Thin Films Formed By Vacuum Evaporation Technique

2008 ◽  
Author(s):  
Ajit Mahadkar ◽  
Alka Chauhan ◽  
Madhavi Thakurdesai ◽  
Deepak Gaikwad ◽  
P. Predeep ◽  
...  
Keyword(s):  
Thin Films ◽  
Vacuum Evaporation ◽  
Structural Studies ◽  
Evaporation Technique ◽  
Cdte Thin Films ◽  
Vacuum Evaporation Technique

Simultaneous Occurrence of Multiphases in the Interfacial Reactions of Ultrahigh Vacuum Deposited Ti, Hf and Cr Thin Films on (111)Si

1993 ◽  
Vol 311 ◽  
Author(s):  
W.W. Hsieh ◽  
J.J. Lin ◽  
M.M. Wang ◽  
L.L. Chen
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Ultrahigh Vacuum ◽  
Interfacial Reactions ◽  
Simultaneous Occurrence ◽  
Image Simulation ◽  
Reaction Sequence ◽  
Transmission Electron ◽  
Amorphous Interlayer

ABSTRACTSimultaneous occurrence of multiphases was observed in the interfacial reactions of ultrahigh vacuum deposited Ti, Hf and Cr thin films on (111)Si by high resolution transmission electron microscopy in conjunction with fast Fourier transform diffraction analysis and image simulation. For the three systems, an amorphous interlayer as well as a number of crystalline phase were found to form simultaneously in the early stages of interfacial reactions. The formation of multiphases appeared to be quite general in the initial stages of interfacial reactions of UHV deposited refractory thin films. The results called for a reexamination of generally accepted “difference” in reaction sequence between bulk and thin film couples.

CHARACTERIZATION OF ALUMINIUM FILMS DEPOSITED BY ION-BEAM-ASSISTED ULTRAHIGH VACUUM EVAPORATION

1990 ◽  
pp. 963-974
Author(s):  
V. DIETZ ◽  
P. EHRHART ◽  
D. GUGGI ◽  
H.-G. HAUBOLD ◽  
W. JÄGER ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ultrahigh Vacuum ◽  
Vacuum Evaporation
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