Erratum: Magnetic Proximity Effect in an Antiferromagnetic Insulator/Topological Insulator Heterostructure with Sharp Interface [Chin. Phys. Lett. 38 (2021) 057303]
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We should add the following acknowledge: Jing Teng thanks the support from the Youth Innovation Promotion Association Project, Chinese Academy of Sciences.
2015 ◽
Vol 9
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pp. 175-179
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2012 ◽
Vol 19
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pp. 987-996
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