Low-temperature deposition of silicon oxide films by microwave plasma CVD of TEOS

1990 ◽  
Vol 5 (4) ◽  
pp. 361-363 ◽  
Author(s):  
S K Ray ◽  
C K Maiti ◽  
S K Lahiri ◽  
N B Chakraborti
Keyword(s):  
Low Temperature ◽  
Silicon Oxide ◽  
Microwave Plasma ◽  
Oxide Films ◽  
Plasma Cvd ◽  
Low Temperature Deposition ◽  
Microwave Plasma Cvd ◽  
Temperature Deposition

The Deposition of Silicon Oxide Films by LPCVD at Temperatures as Low as 100°C from a New Liquid Source

1992 ◽  
Vol 282 ◽  
Author(s):  
K. Hochberg ◽  
David A. Roberts
Keyword(s):  
Low Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Temperature Sensitive ◽  
Oxide Layers ◽  
Low Temperature Deposition ◽  
Liquid Source ◽  
Temperature Deposition ◽  
Higher Temperature

ABSTRACTA precursor for the LPCVD of silicon oxide films has been developed that extends the low temperature deposition range to 100°C. The chemical, 1,4 disilabutane (DSB), produces silicon oxide depositions similar to those of the higher temperature silane and diethylsilane (DES) processes. Optimum DSB processes require pressures below 300 mTorr, similar to silane, in contrast to DES pressures above 600 mTorr at 350°C. This results in poorer conformalities than those of DES, but the step coverages are still superior to those from silane oxides. The DSB films are low stress, carbon-free oxide layers that are suitable for temperature-sensitive underlayers and substrates such as photoresist, plastics, GaAs, and HgCdTe.

Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD

1988 ◽  
Vol 27 (Part 2, No. 10) ◽  
pp. L1962-L1965 ◽  
Author(s):  
Takuya Fukuda ◽  
Kazuo Suzuki ◽  
Shigeru Takahashi ◽  
Yasuhiro Mochizuki ◽  
Michio Ohue ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Silicon Oxide ◽  
Microwave Plasma ◽  
Oxide Films ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Effects of Excited Plasma Species on Silicon Oxide Films Formed by Microwave Plasma CVD

1989 ◽  
Vol 28 (Part 1, No. 6) ◽  
pp. 1035-1040 ◽  
Author(s):  
Takuya Fukuda ◽  
Michio Ohue ◽  
Naohiro Momma ◽  
Kazuo Suzuki ◽  
Tadashi Sonobe
Keyword(s):  
Silicon Oxide ◽  
Microwave Plasma ◽  
Oxide Films ◽  
Plasma Cvd ◽  
Plasma Species ◽  
Microwave Plasma Cvd

Low-Temperature Deposition of Silicon Oxide Films

1963 ◽  
Vol 110 (5) ◽  
pp. 465 ◽  
Author(s):  
Leslie L. Alt ◽  
Samuel W. Ing ◽  
Karl W. Laendle
Keyword(s):  
Low Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Low Temperature Deposition ◽  
Temperature Deposition

Low Temperature Deposition of High Quality Silicon Oxide Films

1990 ◽  
Author(s):  
Hideo IZAWA ◽  
Yutaka NISHI ◽  
Masaya OKAMOTO ◽  
Hiroshi MORIMOTO ◽  
Mitsuo ISHII
Keyword(s):  
Low Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
High Quality ◽  
Low Temperature Deposition ◽  
Temperature Deposition

Low-temperature graphene synthesis using microwave plasma CVD

2013 ◽  
Vol 46 (6) ◽  
pp. 063001 ◽  
Author(s):  
Takatoshi Yamada ◽  
Jaeho Kim ◽  
Masatou Ishihara ◽  
Masataka Hasegawa
Keyword(s):  
Low Temperature ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Graphene Synthesis ◽  
Microwave Plasma Cvd
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