Low temperature deposition of SiN[sub x]:H using SiH[sub 4]–N[sub 2] or SiH[sub 4]–NH[sub 3] distributed electron cyclotron resonance microwave plasma

Microwave Plasma ◽

Electron Cyclotron ◽

Temperature Deposition ◽

Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Cited By ~ 20

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

New approach to low temperature deposition of high-quality thin films by electron cyclotron resonance microwave plasmas

10.1116/1.586185 ◽

1992 ◽

Vol 10 (5) ◽

pp. 2170 ◽

Cited By ~ 7

Author(s):

T. T. Chau

Keyword(s):

Thin Films ◽

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Microwave Plasmas ◽

High Quality ◽

New Approach ◽

Temperature Deposition ◽

Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays

Proceedings of the IEEE ◽

10.1109/jproc.2005.851533 ◽

2005 ◽

Vol 93 (7) ◽

pp. 1364-1373 ◽

Cited By ~ 11

Author(s):

A.J. Flewitt ◽

W.I. Milne

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Electron Cyclotron ◽

Flexible Displays ◽

Temperature Deposition ◽

Hydrogenated Amorphous

Low-Temperature Sputter-Deposition of Ni-Zn Ferrite Thin Films Using Electron-Cyclotron-Resonance Microwave Plasma.

Journal of the Magnetics Society of Japan ◽

10.3379/jmsjmag.27.363 ◽

2003 ◽

Vol 27 (4) ◽

pp. 363-366 ◽

Cited By ~ 5

Author(s):

S. Yamamoto ◽

H. Wada ◽

H. Kurisu ◽

M. Matsuura ◽

Y. Shimosato

Keyword(s):

Thin Films ◽

Low Temperature ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Sputter Deposition ◽

Electron Cyclotron ◽

Zn Ferrite ◽

Ferrite Thin Films ◽

Low-Temperature Deposition of SrTiO3Thin Films by Electron-Cyclotron-Resonance Sputtering for Monolithic Microwave Integrated Circuits Operating in the mm-Wave Band

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.1960 ◽

1998 ◽

Vol 37 (Part 1, No. 4A) ◽

pp. 1960-1963 ◽

Cited By ~ 4

Author(s):

Kenji Ikuta ◽

Mitsuo Tsukada ◽

Hiroshi Nishimura

Keyword(s):

Low Temperature ◽

Integrated Circuits ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Wave Band ◽

Microwave Integrated Circuits ◽

Monolithic Microwave Integrated Circuits ◽

Temperature Deposition

ChemInform Abstract: Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)- Titanium in an Electron Cyclotron Resonance Plasma Process.

ChemInform ◽

10.1002/chin.199425027 ◽

2010 ◽

Vol 25 (25) ◽

pp. no-no

Author(s):

A. WEBER ◽

R. NIKULSKI ◽

C.-P. KLAGES ◽

M. E. GROSS ◽

W. L. BROWN ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)‐Titanium in an Electron Cyclotron Resonance Plasma Process

Journal of The Electrochemical Society ◽

10.1149/1.2054820 ◽

1994 ◽

Vol 141 (3) ◽

pp. 849-853 ◽

Cited By ~ 21

Author(s):

A. Weber ◽

R. Nikulski ◽

C. ‐P. Klages ◽

M. E. Gross ◽

W. L. Brown ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4393 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4393-4396 ◽

Cited By ~ 3

Author(s):

Yasunori Ohtsu ◽

Keiichi Mori ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Distribution Functions ◽

Electron Cyclotron ◽

Energy Distribution Functions ◽

Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580699 ◽

1997 ◽

Vol 15 (3) ◽

pp. 647-653 ◽

Cited By ~ 6

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Molecular Species ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Kinetic modeling of microscopic processes during electron cyclotron resonance microwave plasma‐assisted molecular beam epitaxial growth of GaN/GaAs‐based heterostructures

Applied Physics Letters ◽

10.1063/1.115682 ◽

1996 ◽

Vol 68 (11) ◽

pp. 1510-1512 ◽

Cited By ~ 20

Author(s):

Z. Z. Bandić ◽

R. J. Hauenstein ◽

M. L. O’Steen ◽

T. C. McGill

Keyword(s):

Epitaxial Growth ◽

Kinetic Modeling ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Molecular Beam Epitaxial ◽

Molecular Beam Epitaxial Growth ◽