Two-degree-of-freedom displacement measurement system based on double diffraction gratings

2016 ◽  
Vol 27 (7) ◽  
pp. 074012 ◽  
Author(s):  
Zhengang Lu ◽  
Peipei Wei ◽  
Chaoqun Wang ◽  
Jialei Jing ◽  
Jiubin Tan ◽  
...  
2000 ◽  
Vol 71 (8) ◽  
pp. 3214-3219 ◽  
Author(s):  
Jong-Ahn Kim ◽  
Kyung-Chan Kim ◽  
Eui Won Bae ◽  
Soohyun Kim ◽  
Yoon Keun Kwak

2000 ◽  
Author(s):  
Jong-Ahn Kim ◽  
Kyung-Chan Kim ◽  
Eui W. Bae ◽  
Soo Hyun Kim ◽  
Yoon Keun Kwak

Sensors ◽  
2019 ◽  
Vol 19 (14) ◽  
pp. 3219 ◽  
Author(s):  
Fuzhong Yang ◽  
Ming Zhang ◽  
Yu Zhu ◽  
Weinan Ye ◽  
Leijie Wang ◽  
...  

In the displacement measurement of the wafer stage in lithography machines, signal quality is affected by the relative angular position between the encoder head and the grating. In this study, a two-degree-of-freedom fiber-coupled heterodyne grating interferometer with large operating range of rotation is presented. Fibers without fiber couplers are utilized to receive the interference beams for high-contrast signals under the circumstances of large angular displacement and ZEMAX ray tracing software simulation and experimental validation have been carried out. Meanwhile, a reference beam generated inside the encoder head is adopted to suppress the thermal drift of the interferometer. Experimental results prove that the proposed grating interferometer could realize sub-nanometer displacement measurement stability in both in-plane and out-of-plane directions, which is 0.246 nm and 0.465 nm of 3σ value respectively within 30 s.


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