Erratum: Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (2017 J. Phys. D: Appl. Phys. 50 414001)
2017 ◽
Vol 50
(46)
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pp. 469601
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2017 ◽
Vol 50
(41)
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pp. 414001
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Keyword(s):
2017 ◽
Vol 409
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pp. 158-162
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2016 ◽
Vol 478
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pp. 287-294
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Keyword(s):
Keyword(s):
2003 ◽
Vol 219
(1-2)
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pp. 93-101
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