Enhanced chemical etch rate of borosilicate glass via spatially resolved laser-generated color centers

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/ab6515 ◽

2020 ◽

Vol 53 (13) ◽

pp. 135306

Author(s):

A A Serkov ◽

H V Snelling

Keyword(s):

Borosilicate Glass ◽

Etch Rate ◽

Color Centers ◽

Spatially Resolved ◽

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Color centers of a borosilicate glass induced by 10MeV proton, 1.85MeV electron and 60Co-γ ray

Radiation Physics and Chemistry ◽

10.1016/j.radphyschem.2013.01.044 ◽

2013 ◽

Vol 86 ◽

pp. 59-63 ◽

Author(s):

Jishi Du ◽

Jiehua Wu ◽

Lili Zhao ◽

Lixin Song

Keyword(s):

Borosilicate Glass ◽

Color Centers ◽

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The effect of substrate temperature and bias on the stress, chemical etch rate, and microstructure of high deposition rate sputtered SiO2 films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577312 ◽

1991 ◽

Vol 9 (4) ◽

pp. 2302-2308 ◽

Author(s):

C. V. Macchioni

Keyword(s):

Substrate Temperature ◽

Deposition Rate ◽

Etch Rate ◽

High Deposition Rate ◽

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Chemical Etch Rate Studies on Sputtered Chromium Films

Journal of The Electrochemical Society ◽

10.1149/1.2404209 ◽

1972 ◽

Vol 119 (3) ◽

pp. 392 ◽

Author(s):

Alan R. Janus

Keyword(s):

Etch Rate ◽

Chemical Etch ◽

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Dependence of the chemical etch rate and etch time of silicon on the post-implanted diffusion depth: application for membrane achievement

Journal of Materials Science Letters ◽

10.1007/bf00627041 ◽

1993 ◽

Vol 12 (20) ◽

pp. 1652-1653 ◽

Author(s):

F. Gaiseanu ◽

C. Cobianu ◽

D. Dascalu

Keyword(s):

Etch Rate ◽

Chemical Etch ◽

Diffusion Depth ◽

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Surface damage and color centers generated by femtosecond pulses in borosilicate glass and silica

Applied Physics A ◽

10.1007/s00339-004-2634-x ◽

2004 ◽

Vol 79 (4-6) ◽

pp. 1075-1077 ◽

Author(s):

A. Hertwig ◽

S. Martin ◽

J. Krüger ◽

W. Kautek

Keyword(s):

Borosilicate Glass ◽

Surface Damage ◽

Color Centers ◽

Femtosecond Pulses

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The influence of varying sputter deposition conditions on the wet chemical etch rate of AlN thin films

10.1117/12.721686 ◽

2007 ◽

Author(s):

A. Ababneh ◽

H. Kreher ◽

H. Seidel ◽

U. Schmid

Keyword(s):

Etch Rate ◽

Sputter Deposition ◽

Chemical Etch ◽

Wet Chemical ◽

Deposition Conditions

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Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO2 Films Prepared Using High Pressure Oxygen

Journal of The Electrochemical Society ◽

10.1149/1.2129677 ◽

1980 ◽

Vol 127 (2) ◽

pp. 396-399 ◽

Author(s):

E. A. Irene ◽

D. W. Dong ◽

R. J. Zeto

Keyword(s):

Residual Stress ◽

High Pressure ◽

Refractive Index ◽

Etch Rate ◽

Density Measurements ◽

Pressure Oxygen ◽

Chemical Etch ◽

High Pressure Oxygen

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Spatially resolved UV-VIS characterization of radiation-induced color centers in poly(styrene) and poly(vinyltoluene)

Radiation Physics and Chemistry ◽

10.1016/0969-806x(93)90042-s ◽

1993 ◽

Vol 41 (1-2) ◽

pp. 57-64 ◽

Author(s):

Philip C. Trimmer ◽

Joseph B. Schlenoff ◽

Kurtis F. Johnson

Keyword(s):

Color Centers ◽

Spatially Resolved ◽

Radiation Induced

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Chemical Etch Rate and X-Ray Structure of Reactive Sputtered c-Axis Aligned Crystalline InxGayZnzO4Films

ECS Journal of Solid State Science and Technology ◽

10.1149/2.0261505jss ◽

2015 ◽

Vol 4 (5) ◽

pp. Q43-Q45 ◽

Author(s):

Bin Zhu ◽

David M. Lynch ◽

Chen-yang Chung ◽

Dieter G. Ast ◽

Raymond G. Greene ◽

...

Keyword(s):

Etch Rate ◽

X Ray ◽

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Junction Delineation in GaSb by Differential Chemical Etch Rate

Journal of The Electrochemical Society ◽

10.1149/1.2425352 ◽

1962 ◽

Vol 109 (2) ◽

pp. 166 ◽

Author(s):

S. J. Silverman

Keyword(s):

Etch Rate ◽

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