Dependence of the chemical etch rate and etch time of silicon on the post-implanted diffusion depth: application for membrane achievement
1993 ◽
Vol 12
(20)
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pp. 1652-1653
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1991 ◽
Vol 9
(4)
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pp. 2302-2308
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Keyword(s):
1972 ◽
Vol 119
(3)
◽
pp. 392
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1980 ◽
Vol 127
(2)
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pp. 396-399
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Keyword(s):
2015 ◽
Vol 4
(5)
◽
pp. Q43-Q45
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1962 ◽
Vol 109
(2)
◽
pp. 166
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