Characterization of dielectric function for metallic thin films based on ellipsometric parameters and reflectivity

2019 ◽  
Vol 94 (8) ◽  
pp. 085802 ◽  
Author(s):  
Jiamin Liu ◽  
Jianbin Lin ◽  
Hao Jiang ◽  
Honggang Gu ◽  
Xiuguo Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Function ◽  
Metallic Thin Films

Mechanical Characterization of Nanostructured Thin Films Used to Imporve Mechatronic Components

2017 ◽  
Vol 15 (12) ◽  
pp. 48-54
Author(s):  
Liliana-Laura Badita ◽  
Gheorghe Gheorghe ◽  
Vasile Bratu ◽  
Valentin Gornoava ◽  
Marian Vocurek ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Characterization ◽  
Steel Substrate ◽  
Metallic Thin Films ◽  
Substrate Type ◽  
Different Types ◽  
The Common ◽  
Scratch Tests ◽  
Steel Substrates

Abstract Taking into account the importance of mechatronic applications, researches regarding the possibility to improve the lifetime of mechatronic components were made. Nanostructured metallic thin films (Ti, Cr, Al and Ti/Al multilayer) were deposited on different types of steel substrates, because nanomaterials have exceptional properties in relation to the common materials. In this paper a part of the results obtained after mechanical and topographic characterization of the thin films are presented. Cr is the deposited thin film showing the highest hardness on the surface of steel substrate type OSC. After the scratch tests realized, Ti layer presented the best adhesion on all types of steel substrates used in experiments. The results of these researches could be extremely useful for engineers in the mechatronic field.

Mechanical characterization of metallic thin films by bulge and scratch testing

2016 ◽  
Vol 289 ◽  
pp. 69-74 ◽  
Author(s):  
Hassan Javed ◽  
Benoit Merle ◽  
Eva Preiß ◽  
Romain Hivet ◽  
Alessandro Benedetto ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Characterization ◽  
Metallic Thin Films ◽  
Scratch Testing

Metal slanted columnar thin film THz optical sensors

2012 ◽  
Vol 1409 ◽  
Author(s):  
T. Hofmann ◽  
D. Schmidt ◽  
A. Boosalis ◽  
P. Kühne ◽  
C.M. Herzinger ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dielectric Properties ◽  
Dielectric Function ◽  
Optical Sensors ◽  
Chemical Constituents ◽  
Optical Response ◽  
Liquid Chemical ◽  
Columnar Thin Film

ABSTRACTWe demonstrate that the anisotropic optical response of metal (cobalt) slanted columnar thin films (STF) at THz frequencies strongly depends on the dielectric properties of the dielectric ambient surrounding the slanted columnar thin films. An effective medium dielectric function approach is used to describe the combined optical response of metal slanted columnar thin film and dielectric ambient. Our observations indicate that metal (cobalt) slanted columnar thin films can be used as sensors which will enable detection and characterization of minute amounts of dielectrics at THz frequencies, such as for flow-based detection of liquid chemical constituents.

Reflectance anisotropy spectroscopy as a tool for mechanical characterization of metallic thin films

2015 ◽  
Vol 48 (41) ◽  
pp. 415303 ◽  
Author(s):  
A Wyss ◽  
M Schamel ◽  
A S Sologubenko ◽  
R Denk ◽  
M Hohage ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Characterization ◽  
Metallic Thin Films ◽  
Reflectance Anisotropy

Rocking Beam Microarea Diffraction Applied to Metallic thin Films

1976 ◽  
Vol 34 ◽  
pp. 396-397
Author(s):  
R. H. Geiss
Keyword(s):  
Thin Films ◽  
Electron Diffraction ◽  
Small Area ◽  
Objective Lens ◽  
Electron Optics ◽  
Metallic Thin Films ◽  
Transmission Electron Diffraction ◽  
Transmission Electron ◽  
Sample Height ◽  
Scanning Transmission

The theory and practical limitations of micro area scanning transmission electron diffraction (MASTED) will be presented. It has been demonstrated that MASTED patterns of metallic thin films from areas as small as 30 Åin diameter may be obtained with the standard STEM unit available for the Philips 301 TEM. The key to the successful application of MASTED to very small area diffraction is the proper use of the electron optics of the STEM unit. First the objective lens current must be adjusted such that the image of the C2 aperture is quasi-stationary under the action of the rocking beam (obtained with 40-80-160 SEM settings of the P301). Second, the sample must be elevated to coincide with the C2 aperture image and its image also be quasi-stationary. This sample height adjustment must be entirely mechanical after the objective lens current has been fixed in the first step.

Electron microscopic characterization of diamond thin films and substrates for diamond heteroepitaxial growth

1989 ◽  
Vol 47 ◽  
pp. 592-593
Author(s):  
J.B. Posthill ◽  
R.P. Burns ◽  
R.A. Rudder ◽  
Y.H. Lee ◽  
R.J. Markunas ◽  
...  
Keyword(s):  
Thin Films ◽  
Wide Band ◽  
Deposition Process ◽  
Heteroepitaxial Growth ◽  
Electron Microscopic ◽  
Wide Band Gap ◽  
Lattice Matching ◽  
Different Types ◽  
Diamond Thin Films

Because of diamond’s wide band gap, high thermal conductivity, high breakdown voltage and high radiation resistance, there is a growing interest in developing diamond-based devices for several new and demanding electronic applications. In developing this technology, there are several new challenges to be overcome. Much of our effort has been directed at developing a diamond deposition process that will permit controlled, epitaxial growth. Also, because of cost and size considerations, it is mandatory that a non-native substrate be developed for heteroepitaxial nucleation and growth of diamond thin films. To this end, we are currently investigating the use of Ni single crystals on which different types of epitaxial metals are grown by molecular beam epitaxy (MBE) for lattice matching to diamond as well as surface chemistry modification. This contribution reports briefly on our microscopic observations that are integral to these endeavors.

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