Simulation Analysis of Voltage Distribution of 500kV Degraded Magnetic Insulator String

From the angle of voltage distribution, the influence of DG on power network was studied, various access position and access capacity of DG were analyzed, and conclusion can be drew that DG can help optimize the voltage distribution in the power network. Besides, the output of photovoltaic and wind power was characterized by varying with time, and based on that, the voltage distribution was simulated when they were both connected in the same distribution network. According to the simulation result, some valuable principles and necessary procedures have been proposed.

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Simulation analysis on new scheme of underground HV (high-voltage) distribution networks

2012 IEEE Symposium on Robotics and Applications (ISRA) ◽

10.1109/isra.2012.6219264 ◽

2012 ◽

Author(s):

Jian Tu

Keyword(s):

High Voltage ◽

Simulation Analysis ◽

Distribution Networks ◽

Voltage Distribution

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Simulation analysis of a low-voltage distribution system with small capacity energy storages

2015 IEEE 2nd International Future Energy Electronics Conference (IFEEC) ◽

10.1109/ifeec.2015.7361568 ◽

2015 ◽

Author(s):

Y. J. Liu ◽

G. W. Chang ◽

K. K. Jen ◽

C. S. Chung ◽

J. H. Chen

Keyword(s):

Distribution System ◽

Low Voltage ◽

Simulation Analysis ◽

Voltage Distribution ◽

Small Capacity

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Optimizing Overall equipment effectiveness through simulation analysis

PsycEXTRA Dataset ◽

10.1037/e582772013-006 ◽

2012 ◽

Author(s):

Anand S. Relkar ◽

K. N. Nandurkar

Keyword(s):

Simulation Analysis

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Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

The European Physical Journal Applied Physics ◽

10.1051/epjap/2020190250 ◽

2020 ◽

Vol 90 (3) ◽

pp. 30502

Author(s):

Alessandro Fantoni ◽

João Costa ◽

Paulo Lourenço ◽

Manuela Vieira

Keyword(s):

Amorphous Silicon ◽

High Throughput Screening ◽

Simulation Analysis ◽

Low Cost ◽

Deposition Process ◽

Large Area ◽

Sidewall Roughness ◽

Sensing Applications ◽

Fabrication Defects ◽

The Impact

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.

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