scholarly journals Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating method

Author(s):  
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1998 ◽  
Vol 46 (2) ◽  
pp. 139-145 ◽  
Author(s):  
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Go Sakai ◽  
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Norio Miura ◽  
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2012 ◽  
Vol 20 (10) ◽  
pp. 589-595 ◽  
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Ken Hoshino ◽  
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Rick E. Presley ◽  
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2007 ◽  
Vol 28 (4) ◽  
pp. 273-275 ◽  
Author(s):  
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Nobuyuki Kaji ◽  
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