Core hole processes in x-ray absorption and photoemission by resonant Auger-electron spectroscopy and first-principles theory

Physical Review B ◽

10.1103/physrevb.101.245105 ◽

2020 ◽

Vol 101 (24) ◽

Author(s):

J. C. Woicik ◽

C. Weiland ◽

A. K. Rumaiz ◽

M. T. Brumbach ◽

J. M. Ablett ◽

...

Keyword(s):

Auger Electron Spectroscopy ◽

First Principles ◽

Electron Spectroscopy ◽

Auger Electron ◽

Core Hole ◽

X Ray ◽

X Ray Absorption

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Combined x-ray photoelectron/Auger electron spectroscopy/glancing angle x-ray diffraction/extended x-ray absorption fine structure investigation of TiBxNy coatings

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580526 ◽

1997 ◽

Vol 15 (2) ◽

pp. 284-291 ◽

Author(s):

M. A. Baker ◽

T. P. Mollart ◽

P. N. Gibson ◽

W. Gissler

Keyword(s):

Fine Structure ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Structure Investigation ◽

X Ray Diffraction ◽

X Ray ◽

Absorption Fine ◽

Glancing Angle ◽

X Ray Absorption

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X-Ray Absorption, Photoemission, and Auger Electron Spectroscopy: Electronic Structure and Growth of Metal/Metal Interfaces

Materials Science Forum ◽

10.4028/www.scientific.net/msf.59-60.161 ◽

1991 ◽

Vol 59-60 ◽

pp. 161-228

Author(s):

B. Carrière ◽

G. Krill

Keyword(s):

Electronic Structure ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Metal Metal ◽

Metal Interfaces ◽

X Ray Absorption

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X-ray absorption and Auger electron spectroscopy studies of the quality of diamond thin films grown by the oxy-acetylene flame method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580483 ◽

1997 ◽

Vol 15 (2) ◽

pp. 294-297 ◽

Author(s):

A. Gutiérrez ◽

M. F. López ◽

I. García ◽

A. Vázquez

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Diamond Thin Films ◽

Flame Method ◽

Spectroscopy Studies ◽

X Ray Absorption

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results

10.3403/30242215 ◽

2011 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Study of amorphous and crystallised Fe75B25 by Auger electron spectroscopy and X-ray photoelectron spectroscopy

Applied Surface Science ◽

10.1016/0169-4332(91)90396-2 ◽

1991 ◽

Vol 51 (3-4) ◽

pp. 139-155 ◽

Author(s):

S.K. Sharma ◽

S. Hofmann

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

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X-ray photoemission and Auger electron spectroscopy analysis of fast responding activated metal oxide silicon carbide gas sensors

Thin Solid Films ◽

10.1016/s0040-6090(96)09407-2 ◽

1997 ◽

Vol 299 (1-2) ◽

pp. 183-189 ◽

Author(s):

A Lloyd Spetz ◽

D Schmeißer ◽

A Baranzahi ◽

B Wälivaara ◽

W Göpel ◽

...

Keyword(s):

Silicon Carbide ◽

Metal Oxide ◽

Auger Electron Spectroscopy ◽

Gas Sensors ◽

Electron Spectroscopy ◽

Auger Electron ◽

Spectroscopy Analysis ◽

Auger Electron Spectroscopy Analysis ◽

X Ray ◽

Metal Oxide Silicon

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International Standardization of Quantitative Surface Analysis by Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy

Shinku ◽

10.3131/jvsj.48.261 ◽

2005 ◽

Vol 48 (4) ◽

pp. 261-264

Author(s):

Shigeo TANUMA

Keyword(s):

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Quantitative Surface Analysis ◽

International Standardization

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Summary of ISO/TC 201 Standard: XXIX. ISO 20903: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—methods used to determine peak intensities and information required when reporting results

Surface and Interface Analysis ◽

10.1002/sia.2533 ◽

2007 ◽

Vol 39 (5) ◽

pp. 464-466 ◽

Author(s):

C. J. Powell

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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A correlation of Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter‐deposited titanium nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574092 ◽

1986 ◽

Vol 4 (6) ◽

pp. 2463-2469 ◽

Author(s):

Brad J. Burrow ◽

Alan E. Morgan ◽

Russell C. Ellwanger

Keyword(s):

Titanium Nitride ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

X Ray ◽

Sputter Deposited

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