ABSTRACTIn order to understand the properties of intrinsic point defects and their interactions at high defect concentrations GaAs wafers were irradiated at 4.5 K with 3 MeV electrons up to a dose of 4.1019 e-/cm2. The irradiated samples were investigated by X-ray Diffraction and optical absorption spectrocopy. The defect production increases linearly with irradiation dose and characteristic differences are observed for the two sublattices. The Ga-Frenkel pairs are strongly correlated and are characterized by much larger lattice relaxations (Vrel=2–3 atomic volumes) as compared to the As-Frenkel pairs (Vrel ≈ 1 at.voL). The dominating annealing stage around 300 K is attributed to the mobility of the Ga interstitial atoms whereas the As-interstitial atoms can recombine with their vacancies only around 500 K. These results are compared to those for InP, ZnSe and Ge. Implications for the understanding of the damage after ion irradiation and implantation are discussed.
7–10 September 1992 the international conference on Heavy Fenion and Strongly Correlated System (HFCS '92)