scholarly journals Slope selection-driven Ostwald ripening in ZnO thin film growth

2012 ◽  
Vol 86 (4) ◽  
Author(s):  
A. González-González ◽  
C. Polop ◽  
E. Vasco
2020 ◽  
Vol 54 (3) ◽  
pp. 727-750 ◽  
Author(s):  
Wenbin Chen ◽  
Weijia Li ◽  
Zhiwen Luo ◽  
Cheng Wang ◽  
Xiaoming Wang

In this paper, a stabilized second order in time accurate linear exponential time differencing (ETD) scheme for the no-slope-selection thin film growth model is presented. An artificial stabilizing term $ A{\tau }^2\frac{\mathrm{\partial }{\Delta }^2u}{\mathrm{\partial }t}$ is added to the physical model to achieve energy stability, with ETD-based multi-step approximations and Fourier collocation spectral method applied in the time integral and spatial discretization of the evolution equation, respectively. Long time energy stability and detailed 𝓁∞(0,T;𝓁2) error analysis are provided based on the energy method, with a careful estimate of the aliasing error. In addition, numerical experiments are presented to demonstrate the energy decay and convergence rate.


2020 ◽  
Vol 15 (1) ◽  
Author(s):  
Yung-Chen Cheng ◽  
Hsiang-Chen Wang ◽  
Shih-Wei Feng ◽  
Tsai-Pei Li ◽  
Siu-Keung Fung ◽  
...  

2012 ◽  
Vol 110 (4) ◽  
pp. 793-798 ◽  
Author(s):  
Manisha Gupta ◽  
Fatema Rezwana Chowdhury ◽  
Douglas Barlage ◽  
Ying Yin Tsui

2012 ◽  
Vol 2012 ◽  
pp. 1-7 ◽  
Author(s):  
Shao-Ying Ting ◽  
Po-Ju Chen ◽  
Hsiang-Chen Wang ◽  
Che-Hao Liao ◽  
Wen-Ming Chang ◽  
...  

The material and optical properties of ZnO thin film samples grown on different buffer layers on sapphire substrates through a two-step temperature variation growth by molecular beam epitaxy were investigated. The thin buffer layer between the ZnO layer and the sapphire substrate decreased the lattice mismatch to achieve higher quality ZnO thin film growth. A GaN buffer layer slightly increased the quality of the ZnO thin film, but the threading dislocations still stretched along thec-axis of the GaN layer. The use of MgO as the buffer layer decreased the surface roughness of the ZnO thin film by 58.8% due to the suppression of surface cracks through strain transfer of the sample. From deep level emission and rocking curve measurements it was found that the threading dislocations play a more important role than oxygen vacancies for high-quality ZnO thin film growth.


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