Thin Film Growth Simulation Using Cellular Automata State Space, and Neural Nets Methods

Author(s):  
A. G. Jackson ◽  
M. Benedict
2015 ◽  
Vol 592 ◽  
pp. 240-247 ◽  
Author(s):  
Marcus Turowski ◽  
Marco Jupé ◽  
Thomas Melzig ◽  
Pavel Moskovkin ◽  
Alain Daniel ◽  
...  

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.


Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...


2008 ◽  
Vol 254 (23) ◽  
pp. 7838-7842 ◽  
Author(s):  
Shigeo Ohira ◽  
Naoki Arai ◽  
Takayoshi Oshima ◽  
Shizuo Fujita

1991 ◽  
Vol 180 (1-4) ◽  
pp. 11-16 ◽  
Author(s):  
J. Geerk ◽  
G. Linker ◽  
O. Meyer ◽  
F. Ratzel ◽  
J. Reiner ◽  
...  

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