scholarly journals Dependence of count rate on magnetic field in superconducting thin-film TaN single-photon detectors

2012 ◽  
Vol 86 (14) ◽  
Author(s):  
Andreas Engel ◽  
Andreas Schilling ◽  
Konstantin Il'in ◽  
Michael Siegel
Keyword(s):  
Magnetic Field ◽  
Thin Film ◽  
Count Rate ◽  
Single Photon ◽  
Photon Detectors ◽  
Superconducting Thin Film ◽  
Single Photon Detectors

scholarly journals The effect of magnetic field on the intrinsic detection efficiency of superconducting single-photon detectors

2015 ◽  
Vol 106 (9) ◽  
pp. 092602 ◽  
Author(s):  
J. J. Renema ◽  
R. J. Rengelink ◽  
I. Komen ◽  
Q. Wang ◽  
R. Gaudio ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Detection Efficiency ◽  
Single Photon ◽  
Photon Detectors ◽  
Single Photon Detectors

scholarly journals Superconducting nanowire single photon detectors fabricated from an amorphous Mo0.75Ge0.25 thin film

2014 ◽  
Vol 105 (2) ◽  
pp. 022602 ◽  
Author(s):  
V. B. Verma ◽  
A. E. Lita ◽  
M. R. Vissers ◽  
F. Marsili ◽  
D. P. Pappas ◽  
...  
Keyword(s):  
Thin Film ◽  
Single Photon ◽  
Photon Detectors ◽  
Single Photon Detectors ◽  
Superconducting Nanowire

Characterization of MoSi superconducting single-photon detectors in magnetic field

2014 ◽  
pp. 1-1 ◽  
Author(s):  
Alexander Korneev ◽  
Yuliya Korneeva ◽  
Michail Mikhailov ◽  
Alexander Semenov ◽  
Yury Pershin ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Single Photon ◽  
Photon Detectors ◽  
Single Photon Detectors

Preparing Ultrathin MgB2 Thin Film by Ex Situ Annealing of Mg-B Precursor Film

2013 ◽  
Vol 745-746 ◽  
pp. 249-254
Author(s):  
Qian Dai ◽  
Ruo Run Ma ◽  
Qing Rong Feng ◽  
Huai Zhang ◽  
Qian Qian Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Annealing Temperature ◽  
Flat Surface ◽  
Single Photon ◽  
Electron Beam Evaporation ◽  
Annealing Process ◽  
Ex Situ ◽  
Precursor Film ◽  
Photon Detectors ◽  
Single Photon Detectors

Ultrathin MgB2 film is essential for the fabrication of MgB2 superconducting single photon detectors (SSPDs). In this paper, we prepared 20nm and 10nm MgB2 film using ex-situ annealing of Mg-B multilayer method. The precursor films were prepared by electron beam evaporation. A flowing Mg vapour and H2 was introduced in the annealing process to keep MgB2 thin film thermodynamically stable. The annealing temperature was between 680 and 740 and annealing time was 1-10min. 20nm MgB2 films on MgO(111) substrates had the critical temperature (Tc) of 32.2K. The films grew along c-axes direction. As the substrate changed to SiC(001) and Al2O3(001), Tc decreased to 30.3K and 10.2K respectively. For 10nm MgB2 film on SiC(001) substrate, Tc was 24.2K. The self-field critical current density for 10nm and 20nm film on SiC(001) substrate was 2.1×106A/cm2 and 2.3×106A/cm2, respectively. AFM image showed that the film had a flat surface with mean roughness of 0.899nm for 10nm MgB2 film.

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