scholarly journals Relativistic tight-binding approximation method for materials immersed in a uniform magnetic field: Application to crystalline silicon

2015 ◽  
Vol 91 (7) ◽  
Author(s):  
Katsuhiko Higuchi ◽  
Dipendra Bahadur Hamal ◽  
Masahiko Higuchi
Keyword(s):  
Magnetic Field ◽  
Approximation Method ◽  
Uniform Magnetic Field ◽  
Crystalline Silicon ◽  
Tight Binding ◽  
Field Application ◽  
Tight Binding Approximation ◽  
Magnetic Field Application

Modification of Electrodeposited FeNi Alloys by Applying External Magnetic Field

2015 ◽  
Vol 641 ◽  
pp. 157-163 ◽  
Author(s):  
Anna Maria Białostocka ◽  
Piotr Żabiński
Keyword(s):  
Magnetic Field ◽  
Surface Roughness ◽  
External Magnetic Field ◽  
Lorentz Force ◽  
Uniform Magnetic Field ◽  
Field Application ◽  
Alloy Electrodeposition ◽  
Deposit Structure ◽  
Feni Alloys ◽  
Magnetic Field Application

Alloy electrodeposition with superimposed uniform magnetic field leads to Lorentz force generation. The Lorentz force is a factor which is able to modify the deposit structure, its texture, morphology and magnetic properties. The objective of the presented research was to show the composition, morphology and the surface roughness development of Fe-Ni binary alloys electrodeposited under the influence of the uniform magnetic field. The applied magnetic field caused increase of the paramagnetic element content in the alloys. The surface roughness decrease with an external magnetic field application was observed.

scholarly journals Relativistic tight-binding approximation method for materials immersed in the magnetic field

2013 ◽  
Vol 38 (4) ◽  
pp. 663-665
Author(s):  
Katsuhiko Higuchi ◽  
Dipendra Bahadur Hamal ◽  
Kei Yamamoto ◽  
Masahiko Higuchi
Keyword(s):  
Magnetic Field ◽  
Approximation Method ◽  
Tight Binding ◽  
Tight Binding Approximation ◽  
The Magnetic Field
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