Development of hydrogenated amorphous silicon sensors for high energy photon radiotherapy imaging

1990 ◽  
Vol 37 (2) ◽  
pp. 165-170 ◽  
Author(s):  
L.E. Antonuk ◽  
J. Yorkston ◽  
J. Boudry ◽  
M.J. Longo ◽  
J. Jimenez ◽  
...  
2008 ◽  
Vol 35 (2) ◽  
pp. 464-472 ◽  
Author(s):  
Giorgia Nicolini ◽  
Antonella Fogliata ◽  
Eugenio Vanetti ◽  
Alessandro Clivio ◽  
Daniel Vetterli ◽  
...  

2005 ◽  
Vol 862 ◽  
Author(s):  
N. Wyrsch ◽  
C. Miazza ◽  
S. Dunand ◽  
C. Ballif ◽  
A. Shah ◽  
...  

AbstractRadiation tests of 32 μm thick hydrogenated amorphous silicon n-i-p diodes have been performed using a high energy 24 GeV proton beam up to fluences in excess of 1016 protons/cm2. The results are compared to irradiation of similar 1 μm and 32 μm thick n-i-p diodes using a proton beam of 280 keV at a fluence of 3x1013 protons/cm2. Even though both types of irradiation cause a significant drop in photoconductivity of thin or thick diodes, all samples survived the experiment and recover almost fully after a subsequent thermal annealing.


2012 ◽  
Vol 358 (17) ◽  
pp. 2039-2043 ◽  
Author(s):  
Shin-ichiro Sato ◽  
Hitoshi Sai ◽  
Takeshi Ohshima ◽  
Mitsuru Imaizumi ◽  
Kazunori Shimazaki ◽  
...  

1986 ◽  
Vol 42 (5) ◽  
pp. 643-648
Author(s):  
YOSHINOBU SAWA ◽  
KAZUHISA SATO ◽  
MASANORI NAKAZAWA ◽  
KIYOSHI OGURO ◽  
YUKIHIRO KATO ◽  
...  

1992 ◽  
Vol 258 ◽  
Author(s):  
Seong K. Lee ◽  
Jin S. Park ◽  
Yong S. Kim ◽  
Jung R. Hwang ◽  
Chang H. Oh ◽  
...  

ABSTRACTThe experimental results regarding to the effects of ultraviolet (UV) light illumination on the characteristics of hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFT's) have been presented. The device parameters of a-Si:H TFT, such as threshold voltage, field-effect mobility, and subthreshold slope, have been degraded by electrical stress and visible light illumination, but substantially improved by UV radiation. This may be attributed to an annealing effect on the dangling-bond defects, involving a number of phonons generated by absorption of high energy UV photons in the a-Si:H TFT channel. It has been also observed that the off-current of a-Si:H TFT decreases remarkably while the on-current changes very little. From the experimental results, we report that the improved on/off current ratio of a-Si:H TFT may be achieved by UV radiation.


1991 ◽  
Vol 38 (2) ◽  
pp. 636-640 ◽  
Author(s):  
L.E. Antonuk ◽  
C.W. Kim ◽  
J. Boudry ◽  
J. Yorkston ◽  
M.J. Longo ◽  
...  

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