Thermal plasma deposition of nanostructured films

1999 ◽  
Vol 27 (1) ◽  
pp. 46-47 ◽  
Author(s):  
A. Neuman ◽  
J. Blum ◽  
N. Tymiak ◽  
Z. Wong ◽  
N.P. Rao ◽  
...  
Keyword(s):  
Thermal Plasma ◽  
Plasma Deposition ◽  
Nanostructured Films ◽  
Thermal Plasma Deposition

scholarly journals Effects of Pressure on PbTiO3 Thin Film Prepared by Low-Pressure Thermal Plasma Deposition

1999 ◽  
Vol 63 (1) ◽  
pp. 62-67 ◽  
Author(s):  
Shingo Nagata ◽  
Naoki Wakiya ◽  
Kazuo Shinozaki ◽  
Yoshio Masuda ◽  
Nobuyasu Mizutani
Keyword(s):  
Thin Film ◽  
Thermal Plasma ◽  
Plasma Deposition ◽  
Low Pressure ◽  
Thermal Plasma Deposition

Preparation of Superconducting Ba-Ca-Cu-O Thin Films by RF Thermal Plasma Deposition Method

1995 ◽  
pp. 337-340
Author(s):  
Hisataka Yakabe ◽  
Atsusi Kume ◽  
Jian-Guo Wen ◽  
Yuh Shiohara ◽  
Naoki Koshizuka
Keyword(s):  
Thin Films ◽  
Thermal Plasma ◽  
Plasma Deposition ◽  
Deposition Method ◽  
Rf Thermal Plasma ◽  
Thermal Plasma Deposition

Observation of superconductivity in Ba-Ca-Cu-O thin films prepared by RF thermal plasma deposition method

1994 ◽  
Vol 231 (3-4) ◽  
pp. 330-334 ◽  
Author(s):  
H. Yakabe ◽  
J.G. Wen ◽  
A. Kume ◽  
Y. Shiohara ◽  
N. Koshizuka ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Plasma ◽  
Plasma Deposition ◽  
Deposition Method ◽  
Rf Thermal Plasma ◽  
Thermal Plasma Deposition

Expanding Thermal Plasma Deposition of Silicon Dioxide-Like Films for Microelectronic Devices

2002 ◽  
Vol 715 ◽  
Author(s):  
M. Creatore ◽  
M.F.A.M. van Hest ◽  
J. Benedikt ◽  
M.C.M. van de Sanden
Keyword(s):  
Growth Rate ◽  
Thermal Plasma ◽  
Plasma Deposition ◽  
Chemical Properties ◽  
Film Deposition ◽  
High Spectral Resolution ◽  
Microelectronic Devices ◽  
Set Up ◽  
Thermal Plasma Deposition

AbstractIn this paper we report on the use of the expanding thermal plasma (ETP) technique for the deposition of carbon-free SiO2 films by means of hexamethyldisiloxane (HMDSO)/oxygen mixtures, at a growth rate of 8-10 nm/s. Information concerning the film chemical properties and refractive index/growth rate have been obtained by means of FTIR measurements and in situ single wavelength ellipsometry, respectively. Because of its geometry, the ETP configuration has proven its suitability for studies concerning the fragmentation paths of the HMDSO molecule and the reactions occurring in the plasma phase. In this framework, very recent results obtained by coupling the SiO2 film-deposition set up with a very sensitive, high spectral resolution- absorption technique, Cavity Ring Down Spectroscopy, are presented.

Thermal plasma deposition of nanophase hard coatings

2001 ◽  
Vol 142-144 ◽  
pp. 265-271 ◽  
Author(s):  
J. Heberlein ◽  
O. Postel ◽  
S. Girshick ◽  
P. McMurry ◽  
W. Gerberich ◽  
...  
Keyword(s):  
Thermal Plasma ◽  
Plasma Deposition ◽  
Hard Coatings ◽  
Thermal Plasma Deposition
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