Dependence on repetition rate in post-laser annealing process of ion-implanted ZnO nanorods using KrF excimer laser

2013 ◽  
Author(s):  
T. Shimogaki ◽  
T. Ofuji ◽  
M. Higashihata ◽  
H. Ikenoue ◽  
D. Nakamura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Repetition Rate ◽  
Laser Annealing ◽  
Zno Nanorods ◽  
Annealing Process ◽  
Krf Excimer Laser ◽  
Ion Implanted

Effect of High Repetition Pulsed Laser Annealing on Optical Properties of Phosphorus Ion-Implanted ZnO Nanorods

2013 ◽  
Vol 699 ◽  
pp. 383-386
Author(s):  
Tetsuya Shimogaki ◽  
Taihei Ofuji ◽  
Norihiro Tetsuyama ◽  
Kota Okazaki ◽  
Mitsuhiro Higashihata ◽  
...  
Keyword(s):  
Optical Properties ◽  
Ion Implantation ◽  
Repetition Rate ◽  
Laser Annealing ◽  
Zno Nanorods ◽  
Pulsed Laser ◽  
High Repetition ◽  
Pulsed Laser Annealing ◽  
Krf Excimer Laser ◽  
Ion Implanted

We report on the effect of high repetition pulsed laser annealing with a KrF excimer laser on the optical properties of phosphorus ion-implanted ZnO nanorods. The recovery levels of phosphorus ion-implanted ZnO nanorods have been measured by photoluminescence spectra and cathode luminescence (CL) images. After ion implantation on the surface of ZnO nanorods, CL was disappeared over 400 nm below the surface due to the damage caused by ion implantation. When the annealing was performed at a low repetition, CL was recovered only shallow area below the surface. The depth of the annealed area was increased with the repetition rate of the annealing laser. By optimizing the annealing conditions such as the repetition rate, the irradiation fluence and so on, we have succeeded to anneal the whole damaged area over 400 nm in depth and to observe CL. Thus, the effectiveness of high repetition pulsed laser annealing on phosphorus ion-implanted ZnO nanorods was demonstrated.

Effect of laser annealing using high repetition rate pulsed laser on optical properties of phosphorus-ion-implanted ZnO nanorods

2013 ◽  
Vol 114 (2) ◽  
pp. 625-629
Author(s):  
Tetsuya Shimogaki ◽  
Taihei Ofuji ◽  
Norihiro Tetsuyama ◽  
Kota Okazaki ◽  
Mitsuhiro Higashihata ◽  
...  
Keyword(s):  
Optical Properties ◽  
Repetition Rate ◽  
Laser Annealing ◽  
Zno Nanorods ◽  
Pulsed Laser ◽  
High Repetition Rate ◽  
High Repetition ◽  
Ion Implanted

Characterization of excimer laser annealing of ion implanted Si

1982 ◽  
Vol 3 (10) ◽  
pp. 280-283 ◽  
Author(s):  
R.T. Young ◽  
G.A. van der Leeden ◽  
J. Narayan ◽  
W.H. Christie ◽  
R.F. Wood ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Ion Implanted

Long-pulse duration excimer laser annealing of Al+ ion implanted 4H-SiC for pn junction formation

2003 ◽  
Vol 208-209 ◽  
pp. 292-297 ◽  
Author(s):  
C. Dutto ◽  
E. Fogarassy ◽  
D. Mathiot ◽  
D. Muller ◽  
P. Kern ◽  
...  
Keyword(s):  
Pulse Duration ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Pn Junction ◽  
Junction Formation ◽  
Long Pulse ◽  
Ion Implanted
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